Clean bench and method of producing raw material for single crystal silicon

A clean bench comprising a worktable on which polycrystalline silicon is placed, a box part which includes side plates to surround three sides except a front face of a working space above the worktable, and a ceiling plate which covers an upper side of the working space. Supplying holes are formed i...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Miyata, Yukiyasu, Sakai, Kazuhiro
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
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