SELECTIVE REMOVAL CHEMISTRIES FOR SEMICONDUCTOR APPLICATIONS, METHODS OF PRODUCTION AND USES THEREOF

Removal chemistry solutions and methods of production thereof are described herein that include at least one fluorine-based constituent, at least one chelating component, surfactant component, oxidizing component or combination thereof, and at least one solvent or solvent mixture. Removal chemistry...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	MCFARLAND, JOHN, STARZYNSKI, JOHN, YELLOWAGA, DEBORAH, PALMER, BEN, LOWE, MARIE
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	ADHESIVES CHEMISTRY DYES MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS POLISHES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

container_end_page
container_issue
container_start_page
container_title
container_volume
creator	MCFARLAND, JOHN STARZYNSKI, JOHN YELLOWAGA, DEBORAH PALMER, BEN LOWE, MARIE
description	Removal chemistry solutions and methods of production thereof are described herein that include at least one fluorine-based constituent, at least one chelating component, surfactant component, oxidizing component or combination thereof, and at least one solvent or solvent mixture. Removal chemistry solutions and methods of production thereof are also described herein that include at least one low H2O content fluorine-based constituent and at least one solvent or solvent mixture.
format	Patent
fullrecord	<record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP1991637A2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP1991637A2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP1991637A23</originalsourceid><addsrcrecordid>eNqNi0EKwjAQRbtxIeod5gC6qAWly5BMSKDthMy021JqXIkW6v0xggdw9Xmf97bFjbFBLX5AiNjSoBrQDlvPEj0yWIrAGTV1pteSSYXQeK3EU8dHaFEcGQayECJ9lfyD6gz0nHNxGJHsvtjcp8eaDr_dFWBRtDul5TWmdZnm9EzvEUNZ1-Wluqpz9YfyAS1_NKA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>SELECTIVE REMOVAL CHEMISTRIES FOR SEMICONDUCTOR APPLICATIONS, METHODS OF PRODUCTION AND USES THEREOF</title><source>esp@cenet</source><creator>MCFARLAND, JOHN ; STARZYNSKI, JOHN ; YELLOWAGA, DEBORAH ; PALMER, BEN ; LOWE, MARIE</creator><creatorcontrib>MCFARLAND, JOHN ; STARZYNSKI, JOHN ; YELLOWAGA, DEBORAH ; PALMER, BEN ; LOWE, MARIE</creatorcontrib><description>Removal chemistry solutions and methods of production thereof are described herein that include at least one fluorine-based constituent, at least one chelating component, surfactant component, oxidizing component or combination thereof, and at least one solvent or solvent mixture. Removal chemistry solutions and methods of production thereof are also described herein that include at least one low H2O content fluorine-based constituent and at least one solvent or solvent mixture.</description><language>eng ; fre ; ger</language><subject>ADHESIVES ; CHEMISTRY ; DYES ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; PAINTS ; POLISHES</subject><creationdate>2008</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20081119&DB=EPODOC&CC=EP&NR=1991637A2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20081119&DB=EPODOC&CC=EP&NR=1991637A2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MCFARLAND, JOHN</creatorcontrib><creatorcontrib>STARZYNSKI, JOHN</creatorcontrib><creatorcontrib>YELLOWAGA, DEBORAH</creatorcontrib><creatorcontrib>PALMER, BEN</creatorcontrib><creatorcontrib>LOWE, MARIE</creatorcontrib><title>SELECTIVE REMOVAL CHEMISTRIES FOR SEMICONDUCTOR APPLICATIONS, METHODS OF PRODUCTION AND USES THEREOF</title><description>Removal chemistry solutions and methods of production thereof are described herein that include at least one fluorine-based constituent, at least one chelating component, surfactant component, oxidizing component or combination thereof, and at least one solvent or solvent mixture. Removal chemistry solutions and methods of production thereof are also described herein that include at least one low H2O content fluorine-based constituent and at least one solvent or solvent mixture.</description><subject>ADHESIVES</subject><subject>CHEMISTRY</subject><subject>DYES</subject><subject>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>PAINTS</subject><subject>POLISHES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2008</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNi0EKwjAQRbtxIeod5gC6qAWly5BMSKDthMy021JqXIkW6v0xggdw9Xmf97bFjbFBLX5AiNjSoBrQDlvPEj0yWIrAGTV1pteSSYXQeK3EU8dHaFEcGQayECJ9lfyD6gz0nHNxGJHsvtjcp8eaDr_dFWBRtDul5TWmdZnm9EzvEUNZ1-Wluqpz9YfyAS1_NKA</recordid><startdate>20081119</startdate><enddate>20081119</enddate><creator>MCFARLAND, JOHN</creator><creator>STARZYNSKI, JOHN</creator><creator>YELLOWAGA, DEBORAH</creator><creator>PALMER, BEN</creator><creator>LOWE, MARIE</creator><scope>EVB</scope></search><sort><creationdate>20081119</creationdate><title>SELECTIVE REMOVAL CHEMISTRIES FOR SEMICONDUCTOR APPLICATIONS, METHODS OF PRODUCTION AND USES THEREOF</title><author>MCFARLAND, JOHN ; STARZYNSKI, JOHN ; YELLOWAGA, DEBORAH ; PALMER, BEN ; LOWE, MARIE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP1991637A23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2008</creationdate><topic>ADHESIVES</topic><topic>CHEMISTRY</topic><topic>DYES</topic><topic>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>PAINTS</topic><topic>POLISHES</topic><toplevel>online_resources</toplevel><creatorcontrib>MCFARLAND, JOHN</creatorcontrib><creatorcontrib>STARZYNSKI, JOHN</creatorcontrib><creatorcontrib>YELLOWAGA, DEBORAH</creatorcontrib><creatorcontrib>PALMER, BEN</creatorcontrib><creatorcontrib>LOWE, MARIE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MCFARLAND, JOHN</au><au>STARZYNSKI, JOHN</au><au>YELLOWAGA, DEBORAH</au><au>PALMER, BEN</au><au>LOWE, MARIE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SELECTIVE REMOVAL CHEMISTRIES FOR SEMICONDUCTOR APPLICATIONS, METHODS OF PRODUCTION AND USES THEREOF</title><date>2008-11-19</date><risdate>2008</risdate><abstract>Removal chemistry solutions and methods of production thereof are described herein that include at least one fluorine-based constituent, at least one chelating component, surfactant component, oxidizing component or combination thereof, and at least one solvent or solvent mixture. Removal chemistry solutions and methods of production thereof are also described herein that include at least one low H2O content fluorine-based constituent and at least one solvent or solvent mixture.</abstract><oa>free_for_read</oa></addata></record>
fulltext	fulltext_linktorsrc
identifier
ispartof
issn
language	eng ; fre ; ger
recordid	cdi_epo_espacenet_EP1991637A2
source	esp@cenet
subjects	ADHESIVES CHEMISTRY DYES MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS POLISHES
title	SELECTIVE REMOVAL CHEMISTRIES FOR SEMICONDUCTOR APPLICATIONS, METHODS OF PRODUCTION AND USES THEREOF
url	https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-13T23%3A13%3A21IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=MCFARLAND,%20JOHN&rft.date=2008-11-19&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EEP1991637A2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true