Positioning apparatus and exposure apparatus, method of operating a positioning apparatus and device manufacturing method

Positioning apparatus arranged in a vacuum atmosphere comprises: a supporting means including a combination of a magnet arranged on a bottom plate and an electromagnet arranged on a top plate so that the spring element can virtually be disregarded; and a linear motor enabling driving for performing...

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Bibliographische Detailangaben
1. Verfasser:	EMOTO, KEIJI
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY CONTROLLING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS REGULATING SEMICONDUCTOR DEVICES SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
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Beschreibung
Zusammenfassung:	Positioning apparatus arranged in a vacuum atmosphere comprises: a supporting means including a combination of a magnet arranged on a bottom plate and an electromagnet arranged on a top plate so that the spring element can virtually be disregarded; and a linear motor enabling driving for performing positioning of a substrate subjected to positioning without a contact and including a magnet on a movable member side and a coil on a stationary member side. The positioning apparatus employs a non-contact heat controller to externally control the temperature of the substrate without a contact, through a radiation plate, Peltier element and cooling plate supported by a supporting member of the bottom plate, and a black body arranged on the top plate opposed to the radiation plate.