Silicon on metal for MEMS devices

Micro-electromechanical systems (MEMS) pre-fabrication products and methods for forming MEMS devices using silicon-on-metal (SOM) wafers. An embodiment of a method may include the steps of bonding a patterned SOM wafer to a cover wafer (46), thinning the handle layer of the SOM wafer (48), selective...

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Hauptverfasser: PILCHOWSKI, JORG, KLEIN, JONATHAN L
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Sprache:eng ; fre ; ger
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creator PILCHOWSKI, JORG
KLEIN, JONATHAN L
description Micro-electromechanical systems (MEMS) pre-fabrication products and methods for forming MEMS devices using silicon-on-metal (SOM) wafers. An embodiment of a method may include the steps of bonding a patterned SOM wafer to a cover wafer (46), thinning the handle layer of the SOM wafer (48), selectively removing the exposed metal layer (50), and either continuing with final metallization (64) or cover bonding to the back of the active layer (62).
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP1880977A2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP1880977A2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP1880977A23</originalsourceid><addsrcrecordid>eNrjZFAMzszJTM7PUwCi3NSSxByFtPwiBV9X32CFlNSyzOTUYh4G1rTEnOJUXijNzaDg5hri7KGbWpAfn1pckJicmpdaEu8aYGhhYWBpbu5oZEyEEgDmsyR_</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Silicon on metal for MEMS devices</title><source>esp@cenet</source><creator>PILCHOWSKI, JORG ; KLEIN, JONATHAN L</creator><creatorcontrib>PILCHOWSKI, JORG ; KLEIN, JONATHAN L</creatorcontrib><description>Micro-electromechanical systems (MEMS) pre-fabrication products and methods for forming MEMS devices using silicon-on-metal (SOM) wafers. An embodiment of a method may include the steps of bonding a patterned SOM wafer to a cover wafer (46), thinning the handle layer of the SOM wafer (48), selectively removing the exposed metal layer (50), and either continuing with final metallization (64) or cover bonding to the back of the active layer (62).</description><language>eng ; fre ; ger</language><subject>MICROSTRUCTURAL TECHNOLOGY ; PERFORMING OPERATIONS ; PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS ; TRANSPORTING</subject><creationdate>2008</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20080123&amp;DB=EPODOC&amp;CC=EP&amp;NR=1880977A2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20080123&amp;DB=EPODOC&amp;CC=EP&amp;NR=1880977A2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>PILCHOWSKI, JORG</creatorcontrib><creatorcontrib>KLEIN, JONATHAN L</creatorcontrib><title>Silicon on metal for MEMS devices</title><description>Micro-electromechanical systems (MEMS) pre-fabrication products and methods for forming MEMS devices using silicon-on-metal (SOM) wafers. An embodiment of a method may include the steps of bonding a patterned SOM wafer to a cover wafer (46), thinning the handle layer of the SOM wafer (48), selectively removing the exposed metal layer (50), and either continuing with final metallization (64) or cover bonding to the back of the active layer (62).</description><subject>MICROSTRUCTURAL TECHNOLOGY</subject><subject>PERFORMING OPERATIONS</subject><subject>PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2008</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFAMzszJTM7PUwCi3NSSxByFtPwiBV9X32CFlNSyzOTUYh4G1rTEnOJUXijNzaDg5hri7KGbWpAfn1pckJicmpdaEu8aYGhhYWBpbu5oZEyEEgDmsyR_</recordid><startdate>20080123</startdate><enddate>20080123</enddate><creator>PILCHOWSKI, JORG</creator><creator>KLEIN, JONATHAN L</creator><scope>EVB</scope></search><sort><creationdate>20080123</creationdate><title>Silicon on metal for MEMS devices</title><author>PILCHOWSKI, JORG ; KLEIN, JONATHAN L</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP1880977A23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2008</creationdate><topic>MICROSTRUCTURAL TECHNOLOGY</topic><topic>PERFORMING OPERATIONS</topic><topic>PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>PILCHOWSKI, JORG</creatorcontrib><creatorcontrib>KLEIN, JONATHAN L</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>PILCHOWSKI, JORG</au><au>KLEIN, JONATHAN L</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Silicon on metal for MEMS devices</title><date>2008-01-23</date><risdate>2008</risdate><abstract>Micro-electromechanical systems (MEMS) pre-fabrication products and methods for forming MEMS devices using silicon-on-metal (SOM) wafers. An embodiment of a method may include the steps of bonding a patterned SOM wafer to a cover wafer (46), thinning the handle layer of the SOM wafer (48), selectively removing the exposed metal layer (50), and either continuing with final metallization (64) or cover bonding to the back of the active layer (62).</abstract><oa>free_for_read</oa></addata></record>
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subjects MICROSTRUCTURAL TECHNOLOGY
PERFORMING OPERATIONS
PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
TRANSPORTING
title Silicon on metal for MEMS devices
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-24T18%3A56%3A20IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=PILCHOWSKI,%20JORG&rft.date=2008-01-23&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EEP1880977A2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true