Silicon on metal for MEMS devices
Micro-electromechanical systems (MEMS) pre-fabrication products and methods for forming MEMS devices using silicon-on-metal (SOM) wafers. An embodiment of a method may include the steps of bonding a patterned SOM wafer to a cover wafer (46), thinning the handle layer of the SOM wafer (48), selective...
Gespeichert in:
Hauptverfasser: | , |
---|---|
Format: | Patent |
Sprache: | eng ; fre ; ger |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | PILCHOWSKI, JORG KLEIN, JONATHAN L |
description | Micro-electromechanical systems (MEMS) pre-fabrication products and methods for forming MEMS devices using silicon-on-metal (SOM) wafers. An embodiment of a method may include the steps of bonding a patterned SOM wafer to a cover wafer (46), thinning the handle layer of the SOM wafer (48), selectively removing the exposed metal layer (50), and either continuing with final metallization (64) or cover bonding to the back of the active layer (62). |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP1880977A2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP1880977A2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP1880977A23</originalsourceid><addsrcrecordid>eNrjZFAMzszJTM7PUwCi3NSSxByFtPwiBV9X32CFlNSyzOTUYh4G1rTEnOJUXijNzaDg5hri7KGbWpAfn1pckJicmpdaEu8aYGhhYWBpbu5oZEyEEgDmsyR_</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Silicon on metal for MEMS devices</title><source>esp@cenet</source><creator>PILCHOWSKI, JORG ; KLEIN, JONATHAN L</creator><creatorcontrib>PILCHOWSKI, JORG ; KLEIN, JONATHAN L</creatorcontrib><description>Micro-electromechanical systems (MEMS) pre-fabrication products and methods for forming MEMS devices using silicon-on-metal (SOM) wafers. An embodiment of a method may include the steps of bonding a patterned SOM wafer to a cover wafer (46), thinning the handle layer of the SOM wafer (48), selectively removing the exposed metal layer (50), and either continuing with final metallization (64) or cover bonding to the back of the active layer (62).</description><language>eng ; fre ; ger</language><subject>MICROSTRUCTURAL TECHNOLOGY ; PERFORMING OPERATIONS ; PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS ; TRANSPORTING</subject><creationdate>2008</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20080123&DB=EPODOC&CC=EP&NR=1880977A2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20080123&DB=EPODOC&CC=EP&NR=1880977A2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>PILCHOWSKI, JORG</creatorcontrib><creatorcontrib>KLEIN, JONATHAN L</creatorcontrib><title>Silicon on metal for MEMS devices</title><description>Micro-electromechanical systems (MEMS) pre-fabrication products and methods for forming MEMS devices using silicon-on-metal (SOM) wafers. An embodiment of a method may include the steps of bonding a patterned SOM wafer to a cover wafer (46), thinning the handle layer of the SOM wafer (48), selectively removing the exposed metal layer (50), and either continuing with final metallization (64) or cover bonding to the back of the active layer (62).</description><subject>MICROSTRUCTURAL TECHNOLOGY</subject><subject>PERFORMING OPERATIONS</subject><subject>PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2008</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFAMzszJTM7PUwCi3NSSxByFtPwiBV9X32CFlNSyzOTUYh4G1rTEnOJUXijNzaDg5hri7KGbWpAfn1pckJicmpdaEu8aYGhhYWBpbu5oZEyEEgDmsyR_</recordid><startdate>20080123</startdate><enddate>20080123</enddate><creator>PILCHOWSKI, JORG</creator><creator>KLEIN, JONATHAN L</creator><scope>EVB</scope></search><sort><creationdate>20080123</creationdate><title>Silicon on metal for MEMS devices</title><author>PILCHOWSKI, JORG ; KLEIN, JONATHAN L</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP1880977A23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2008</creationdate><topic>MICROSTRUCTURAL TECHNOLOGY</topic><topic>PERFORMING OPERATIONS</topic><topic>PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>PILCHOWSKI, JORG</creatorcontrib><creatorcontrib>KLEIN, JONATHAN L</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>PILCHOWSKI, JORG</au><au>KLEIN, JONATHAN L</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Silicon on metal for MEMS devices</title><date>2008-01-23</date><risdate>2008</risdate><abstract>Micro-electromechanical systems (MEMS) pre-fabrication products and methods for forming MEMS devices using silicon-on-metal (SOM) wafers. An embodiment of a method may include the steps of bonding a patterned SOM wafer to a cover wafer (46), thinning the handle layer of the SOM wafer (48), selectively removing the exposed metal layer (50), and either continuing with final metallization (64) or cover bonding to the back of the active layer (62).</abstract><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | eng ; fre ; ger |
recordid | cdi_epo_espacenet_EP1880977A2 |
source | esp@cenet |
subjects | MICROSTRUCTURAL TECHNOLOGY PERFORMING OPERATIONS PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS TRANSPORTING |
title | Silicon on metal for MEMS devices |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-24T18%3A56%3A20IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=PILCHOWSKI,%20JORG&rft.date=2008-01-23&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EEP1880977A2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |