INTERFEROMETRIC ANALYSIS FOR THE MANUFACTURE OF NANO-SCALE DEVICES

The present invention features a system to determine relative spatial parameters between two coordinate systems, which may be a mold and a region of a substrate in which mold is employed to generate a pattern. The system senses relative alignment between the two coordinate systems at multiple points...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SCHUMAKER, Philip, D, RAFFERTY, Tom H, CHOI, Byung-Jin, NIMMAKAYALA, Pawan K, BABBS, Daniel, A, TRUSKETT, Van, N, AGHILI, Alireza
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS TESTING
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