METHOD FOR PRODUCING PHOTONIC CRYSTALS

METHOD FOR PRODUCING PHOTONIC CRYSTALS

The invention relates to a process for producing photonic crystals by first providing an inorganic photoresist which, on illumination with energy greater than the electronic band gap of the photoresist, exhibits a phase alteration. Illumination of the photoresist with a laser beam whose energy is lo...

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Hauptverfasser: WONG, SEAN H, WEGENER, MARTIN, OZIN, GEOFFREY A, VON FREYMANN, GEORG LUDWIG EBERHARD, DEUBEL, MARKUS
Format: Patent
Sprache:eng ; fre ; ger
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OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
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creator WONG, SEAN H
WEGENER, MARTIN
OZIN, GEOFFREY A
VON FREYMANN, GEORG LUDWIG EBERHARD
DEUBEL, MARKUS
description The invention relates to a process for producing photonic crystals by first providing an inorganic photoresist which, on illumination with energy greater than the electronic band gap of the photoresist, exhibits a phase alteration. Illumination of the photoresist with a laser beam whose energy is lower than the electronic band gap of the photoresist but whose intensity at the focal point is so high that nonlinear effects occur there nevertheless results in a phase alteration in the photoresist. Thereafter, the illuminated photoresist is exposed to an etching solution which preferentially dissolves one phase of the photoresist, and the developed photoresist is finally removed therefrom as a photonic crystal. Inorganic photonic crystals produced by the process according to the invention are suitable for completely optical systems, circuits and components for optical telecommunication or computer systems.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP1784670B1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP1784670B1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP1784670B13</originalsourceid><addsrcrecordid>eNrjZFDzdQ3x8HdRcPMPUggI8ncJdfb0c1cI8PAP8ffzdFZwDooMDnH0CeZhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfGuAYbmFiZm5gZOhsZEKAEAkakjZQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>METHOD FOR PRODUCING PHOTONIC CRYSTALS</title><source>esp@cenet</source><creator>WONG, SEAN H ; WEGENER, MARTIN ; OZIN, GEOFFREY A ; VON FREYMANN, GEORG LUDWIG EBERHARD ; DEUBEL, MARKUS</creator><creatorcontrib>WONG, SEAN H ; WEGENER, MARTIN ; OZIN, GEOFFREY A ; VON FREYMANN, GEORG LUDWIG EBERHARD ; DEUBEL, MARKUS</creatorcontrib><description>The invention relates to a process for producing photonic crystals by first providing an inorganic photoresist which, on illumination with energy greater than the electronic band gap of the photoresist, exhibits a phase alteration. Illumination of the photoresist with a laser beam whose energy is lower than the electronic band gap of the photoresist but whose intensity at the focal point is so high that nonlinear effects occur there nevertheless results in a phase alteration in the photoresist. Thereafter, the illuminated photoresist is exposed to an etching solution which preferentially dissolves one phase of the photoresist, and the developed photoresist is finally removed therefrom as a photonic crystal. Inorganic photonic crystals produced by the process according to the invention are suitable for completely optical systems, circuits and components for optical telecommunication or computer systems.</description><language>eng ; fre ; ger</language><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; PHYSICS</subject><creationdate>2010</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20100217&amp;DB=EPODOC&amp;CC=EP&amp;NR=1784670B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20100217&amp;DB=EPODOC&amp;CC=EP&amp;NR=1784670B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>WONG, SEAN H</creatorcontrib><creatorcontrib>WEGENER, MARTIN</creatorcontrib><creatorcontrib>OZIN, GEOFFREY A</creatorcontrib><creatorcontrib>VON FREYMANN, GEORG LUDWIG EBERHARD</creatorcontrib><creatorcontrib>DEUBEL, MARKUS</creatorcontrib><title>METHOD FOR PRODUCING PHOTONIC CRYSTALS</title><description>The invention relates to a process for producing photonic crystals by first providing an inorganic photoresist which, on illumination with energy greater than the electronic band gap of the photoresist, exhibits a phase alteration. Illumination of the photoresist with a laser beam whose energy is lower than the electronic band gap of the photoresist but whose intensity at the focal point is so high that nonlinear effects occur there nevertheless results in a phase alteration in the photoresist. Thereafter, the illuminated photoresist is exposed to an etching solution which preferentially dissolves one phase of the photoresist, and the developed photoresist is finally removed therefrom as a photonic crystal. Inorganic photonic crystals produced by the process according to the invention are suitable for completely optical systems, circuits and components for optical telecommunication or computer systems.</description><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2010</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFDzdQ3x8HdRcPMPUggI8ncJdfb0c1cI8PAP8ffzdFZwDooMDnH0CeZhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfGuAYbmFiZm5gZOhsZEKAEAkakjZQ</recordid><startdate>20100217</startdate><enddate>20100217</enddate><creator>WONG, SEAN H</creator><creator>WEGENER, MARTIN</creator><creator>OZIN, GEOFFREY A</creator><creator>VON FREYMANN, GEORG LUDWIG EBERHARD</creator><creator>DEUBEL, MARKUS</creator><scope>EVB</scope></search><sort><creationdate>20100217</creationdate><title>METHOD FOR PRODUCING PHOTONIC CRYSTALS</title><author>WONG, SEAN H ; WEGENER, MARTIN ; OZIN, GEOFFREY A ; VON FREYMANN, GEORG LUDWIG EBERHARD ; DEUBEL, MARKUS</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP1784670B13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2010</creationdate><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>WONG, SEAN H</creatorcontrib><creatorcontrib>WEGENER, MARTIN</creatorcontrib><creatorcontrib>OZIN, GEOFFREY A</creatorcontrib><creatorcontrib>VON FREYMANN, GEORG LUDWIG EBERHARD</creatorcontrib><creatorcontrib>DEUBEL, MARKUS</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>WONG, SEAN H</au><au>WEGENER, MARTIN</au><au>OZIN, GEOFFREY A</au><au>VON FREYMANN, GEORG LUDWIG EBERHARD</au><au>DEUBEL, MARKUS</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD FOR PRODUCING PHOTONIC CRYSTALS</title><date>2010-02-17</date><risdate>2010</risdate><abstract>The invention relates to a process for producing photonic crystals by first providing an inorganic photoresist which, on illumination with energy greater than the electronic band gap of the photoresist, exhibits a phase alteration. Illumination of the photoresist with a laser beam whose energy is lower than the electronic band gap of the photoresist but whose intensity at the focal point is so high that nonlinear effects occur there nevertheless results in a phase alteration in the photoresist. Thereafter, the illuminated photoresist is exposed to an etching solution which preferentially dissolves one phase of the photoresist, and the developed photoresist is finally removed therefrom as a photonic crystal. Inorganic photonic crystals produced by the process according to the invention are suitable for completely optical systems, circuits and components for optical telecommunication or computer systems.</abstract><oa>free_for_read</oa></addata></record>
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subjects OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
title METHOD FOR PRODUCING PHOTONIC CRYSTALS
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-30T00%3A04%3A22IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=WONG,%20SEAN%20H&rft.date=2010-02-17&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EEP1784670B1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true