Process and device for magnetron sputtering cleaning a metal strip
The procedure consists of brightening a metal strip (4), especially of steel, in a vacuum chamber (2) prior to coating by subjecting it to a gas plasma as it passes round a roller (3) of a conducting material and faces a counter-electrode (5) generating radicals and/or ions. It differs in the select...
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| creator | MOTTOULLE, JACQUES DEWEER, BENOIT MABOGE, CLAUDE CORNIL, HUGUES |
| description | The procedure consists of brightening a metal strip (4), especially of steel, in a vacuum chamber (2) prior to coating by subjecting it to a gas plasma as it passes round a roller (3) of a conducting material and faces a counter-electrode (5) generating radicals and/or ions. It differs in the selection of a closed magnetic circuit (7) of similar width to the strip from a series of two or more such circuits of different widths, and positioning it so that it faces the strip. The magnetic circuit is made from rows of magnets laid side by side, with two successive rows having opposite polarities, and generates a magnetic field at a tangent to the strip with an intensity of at least 300 Gauss. |
| format | Patent |
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It differs in the selection of a closed magnetic circuit (7) of similar width to the strip from a series of two or more such circuits of different widths, and positioning it so that it faces the strip. 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It differs in the selection of a closed magnetic circuit (7) of similar width to the strip from a series of two or more such circuits of different widths, and positioning it so that it faces the strip. 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It differs in the selection of a closed magnetic circuit (7) of similar width to the strip from a series of two or more such circuits of different widths, and positioning it so that it faces the strip. The magnetic circuit is made from rows of magnets laid side by side, with two successive rows having opposite polarities, and generates a magnetic field at a tangent to the strip with an intensity of at least 300 Gauss.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng ; fre ; ger |
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| subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | Process and device for magnetron sputtering cleaning a metal strip |
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