Thin film device and thin film inductor

Provided is a thin film device capable of ensuring operating performance by ensuring the adhesion of a conductive film and the magnetic characteristic of a magnetic film. A substrate has a surface roughness (an arithmetic mean roughness Ra) within the range expressed in the expression: X µm ‰¦ Ra ‰¦...

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Bibliographische Detailangaben
1. Verfasser: MASAI, TAKU
Format: Patent
Sprache:eng ; fre ; ger
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