Thin film device and thin film inductor
Provided is a thin film device capable of ensuring operating performance by ensuring the adhesion of a conductive film and the magnetic characteristic of a magnetic film. A substrate has a surface roughness (an arithmetic mean roughness Ra) within the range expressed in the expression: X µm ‰¦ Ra ‰¦...
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Patent |
| Sprache: | eng ; fre ; ger |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | MASAI, TAKU |
| description | Provided is a thin film device capable of ensuring operating performance by ensuring the adhesion of a conductive film and the magnetic characteristic of a magnetic film. A substrate has a surface roughness (an arithmetic mean roughness Ra) within the range expressed in the expression: X µm ‰¦ Ra ‰¦ 0.1 µm. A lower limit X of the surface roughness Ra is a value determined based on a series of parameters including an internal stress Ã, a thickness T, and an adhesiveness P per unit length of a conductive film. An anchor effect can be used to ensure the adhesion of the conductive film, and also ensure the magnetic characteristic (magnetic permeability) even when a magnetic film is provided on a substrate having a surface irregular structure. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP1783789A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP1783789A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP1783789A13</originalsourceid><addsrcrecordid>eNrjZFAPycjMU0jLzMlVSEkty0xOVUjMS1EogQtm5qWUJpfkF_EwsKYl5hSn8kJpbgYFN9cQZw_d1IL8-NTigsTk1LzUknjXAENzC2NzC0tHQ2MilAAAHmInLQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Thin film device and thin film inductor</title><source>esp@cenet</source><creator>MASAI, TAKU</creator><creatorcontrib>MASAI, TAKU</creatorcontrib><description>Provided is a thin film device capable of ensuring operating performance by ensuring the adhesion of a conductive film and the magnetic characteristic of a magnetic film. A substrate has a surface roughness (an arithmetic mean roughness Ra) within the range expressed in the expression: X µm ‰¦ Ra ‰¦ 0.1 µm. A lower limit X of the surface roughness Ra is a value determined based on a series of parameters including an internal stress Ã, a thickness T, and an adhesiveness P per unit length of a conductive film. An anchor effect can be used to ensure the adhesion of the conductive film, and also ensure the magnetic characteristic (magnetic permeability) even when a magnetic film is provided on a substrate having a surface irregular structure.</description><language>eng ; fre ; ger</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRICITY ; INDUCTANCES ; MAGNETS ; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES ; TRANSFORMERS</subject><creationdate>2007</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20070509&DB=EPODOC&CC=EP&NR=1783789A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20070509&DB=EPODOC&CC=EP&NR=1783789A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MASAI, TAKU</creatorcontrib><title>Thin film device and thin film inductor</title><description>Provided is a thin film device capable of ensuring operating performance by ensuring the adhesion of a conductive film and the magnetic characteristic of a magnetic film. A substrate has a surface roughness (an arithmetic mean roughness Ra) within the range expressed in the expression: X µm ‰¦ Ra ‰¦ 0.1 µm. A lower limit X of the surface roughness Ra is a value determined based on a series of parameters including an internal stress Ã, a thickness T, and an adhesiveness P per unit length of a conductive film. An anchor effect can be used to ensure the adhesion of the conductive film, and also ensure the magnetic characteristic (magnetic permeability) even when a magnetic film is provided on a substrate having a surface irregular structure.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRICITY</subject><subject>INDUCTANCES</subject><subject>MAGNETS</subject><subject>SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES</subject><subject>TRANSFORMERS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2007</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFAPycjMU0jLzMlVSEkty0xOVUjMS1EogQtm5qWUJpfkF_EwsKYl5hSn8kJpbgYFN9cQZw_d1IL8-NTigsTk1LzUknjXAENzC2NzC0tHQ2MilAAAHmInLQ</recordid><startdate>20070509</startdate><enddate>20070509</enddate><creator>MASAI, TAKU</creator><scope>EVB</scope></search><sort><creationdate>20070509</creationdate><title>Thin film device and thin film inductor</title><author>MASAI, TAKU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP1783789A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2007</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRICITY</topic><topic>INDUCTANCES</topic><topic>MAGNETS</topic><topic>SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES</topic><topic>TRANSFORMERS</topic><toplevel>online_resources</toplevel><creatorcontrib>MASAI, TAKU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MASAI, TAKU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Thin film device and thin film inductor</title><date>2007-05-09</date><risdate>2007</risdate><abstract>Provided is a thin film device capable of ensuring operating performance by ensuring the adhesion of a conductive film and the magnetic characteristic of a magnetic film. A substrate has a surface roughness (an arithmetic mean roughness Ra) within the range expressed in the expression: X µm ‰¦ Ra ‰¦ 0.1 µm. A lower limit X of the surface roughness Ra is a value determined based on a series of parameters including an internal stress Ã, a thickness T, and an adhesiveness P per unit length of a conductive film. An anchor effect can be used to ensure the adhesion of the conductive film, and also ensure the magnetic characteristic (magnetic permeability) even when a magnetic film is provided on a substrate having a surface irregular structure.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng ; fre ; ger |
| recordid | cdi_epo_espacenet_EP1783789A1 |
| source | esp@cenet |
| subjects | BASIC ELECTRIC ELEMENTS ELECTRICITY INDUCTANCES MAGNETS SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES TRANSFORMERS |
| title | Thin film device and thin film inductor |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-30T21%3A14%3A39IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=MASAI,%20TAKU&rft.date=2007-05-09&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EEP1783789A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |