MATRIX LIQUID FOR PRODUCING A CHIP REMOVAL SUSPENSION, AND USED AS A LUBRICATING OR MACHINING LIQUID
The invention relates to a matrix liquid for producing machining suspensions, a machining suspension produced with the matrix and a method of fractionating the used machining suspension yielded after use. The invention also relates to a homogeneous mixture of a polymer or various polymers and water....
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| creator | EISNER, PETER MENNER, MICHAEL |
| description | The invention relates to a matrix liquid for producing machining suspensions, a machining suspension produced with the matrix and a method of fractionating the used machining suspension yielded after use. The invention also relates to a homogeneous mixture of a polymer or various polymers and water. The mixture can be used especially advantageously in all technical applications requiring a liquid with lubricating properties. In the present invention, a mixture of water and a thickening agent, respectively a polymer or a multiplicity of polymers, is utilized as the matrix liquid or lubricating liquid. The cutting grains can be separated very easily and quickly from the used machining suspension produced with this matrix liquid; for reuse. Less process water is required and the process water can be simply purified as there is no complicated getting rid of an alcohol charge. |
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The invention also relates to a homogeneous mixture of a polymer or various polymers and water. The mixture can be used especially advantageously in all technical applications requiring a liquid with lubricating properties. In the present invention, a mixture of water and a thickening agent, respectively a polymer or a multiplicity of polymers, is utilized as the matrix liquid or lubricating liquid. The cutting grains can be separated very easily and quickly from the used machining suspension produced with this matrix liquid; for reuse. Less process water is required and the process water can be simply purified as there is no complicated getting rid of an alcohol charge.</description><language>eng ; fre ; ger</language><subject>ADHESIVES ; CHEMISTRY ; DRESSING OR CONDITIONING OF ABRADING SURFACES ; DYES ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; FUELS ; GRINDING ; LUBRICANTS ; LUBRICATING COMPOSITIONS ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; PAINTS ; PEAT ; PERFORMING OPERATIONS ; PETROLEUM, GAS OR COKE INDUSTRIES ; POLISHES ; POLISHING ; POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH ; SKI WAXES ; TECHNICAL GASES CONTAINING CARBON MONOXIDE ; TRANSPORTING ; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATINGINGREDIENTS IN A LUBRICATING COMPOSITION ; WORKING CEMENT, CLAY, OR STONE ; WORKING STONE OR STONE-LIKE MATERIALS</subject><creationdate>2007</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20070228&DB=EPODOC&CC=EP&NR=1756253A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20070228&DB=EPODOC&CC=EP&NR=1756253A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>EISNER, PETER</creatorcontrib><creatorcontrib>MENNER, MICHAEL</creatorcontrib><title>MATRIX LIQUID FOR PRODUCING A CHIP REMOVAL SUSPENSION, AND USED AS A LUBRICATING OR MACHINING LIQUID</title><description>The invention relates to a matrix liquid for producing machining suspensions, a machining suspension produced with the matrix and a method of fractionating the used machining suspension yielded after use. The invention also relates to a homogeneous mixture of a polymer or various polymers and water. The mixture can be used especially advantageously in all technical applications requiring a liquid with lubricating properties. In the present invention, a mixture of water and a thickening agent, respectively a polymer or a multiplicity of polymers, is utilized as the matrix liquid or lubricating liquid. The cutting grains can be separated very easily and quickly from the used machining suspension produced with this matrix liquid; for reuse. Less process water is required and the process water can be simply purified as there is no complicated getting rid of an alcohol charge.</description><subject>ADHESIVES</subject><subject>CHEMISTRY</subject><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES</subject><subject>DYES</subject><subject>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</subject><subject>FUELS</subject><subject>GRINDING</subject><subject>LUBRICANTS</subject><subject>LUBRICATING COMPOSITIONS</subject><subject>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</subject><subject>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>PAINTS</subject><subject>PEAT</subject><subject>PERFORMING OPERATIONS</subject><subject>PETROLEUM, GAS OR COKE INDUSTRIES</subject><subject>POLISHES</subject><subject>POLISHING</subject><subject>POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH</subject><subject>SKI WAXES</subject><subject>TECHNICAL GASES CONTAINING CARBON MONOXIDE</subject><subject>TRANSPORTING</subject><subject>USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATINGINGREDIENTS IN A LUBRICATING COMPOSITION</subject><subject>WORKING CEMENT, CLAY, OR STONE</subject><subject>WORKING STONE OR STONE-LIKE MATERIALS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2007</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjEsKwjAURTtxIOoe3gJ0UEt1_ExS-yA_8xFnpWgciRbq_jFFF-DocuGcMy9uCoOjC0g6ReLQGAfWGR4Z6SMgsJYsOKHMGSX46K3QnoxeA2oO0QsO6DMm48ERwzBJuaAwe3o63-yymN37x5hWv10U0IjA2k0aXl0ah_6anundCVvu6922rrCs_kA-umMzvg</recordid><startdate>20070228</startdate><enddate>20070228</enddate><creator>EISNER, PETER</creator><creator>MENNER, MICHAEL</creator><scope>EVB</scope></search><sort><creationdate>20070228</creationdate><title>MATRIX LIQUID FOR PRODUCING A CHIP REMOVAL SUSPENSION, AND USED AS A LUBRICATING OR MACHINING LIQUID</title><author>EISNER, PETER ; MENNER, MICHAEL</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP1756253A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2007</creationdate><topic>ADHESIVES</topic><topic>CHEMISTRY</topic><topic>DRESSING OR CONDITIONING OF ABRADING SURFACES</topic><topic>DYES</topic><topic>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</topic><topic>FUELS</topic><topic>GRINDING</topic><topic>LUBRICANTS</topic><topic>LUBRICATING COMPOSITIONS</topic><topic>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</topic><topic>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>PAINTS</topic><topic>PEAT</topic><topic>PERFORMING OPERATIONS</topic><topic>PETROLEUM, GAS OR COKE INDUSTRIES</topic><topic>POLISHES</topic><topic>POLISHING</topic><topic>POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH</topic><topic>SKI WAXES</topic><topic>TECHNICAL GASES CONTAINING CARBON MONOXIDE</topic><topic>TRANSPORTING</topic><topic>USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATINGINGREDIENTS IN A LUBRICATING COMPOSITION</topic><topic>WORKING CEMENT, CLAY, OR STONE</topic><topic>WORKING STONE OR STONE-LIKE MATERIALS</topic><toplevel>online_resources</toplevel><creatorcontrib>EISNER, PETER</creatorcontrib><creatorcontrib>MENNER, MICHAEL</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>EISNER, PETER</au><au>MENNER, MICHAEL</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>MATRIX LIQUID FOR PRODUCING A CHIP REMOVAL SUSPENSION, AND USED AS A LUBRICATING OR MACHINING LIQUID</title><date>2007-02-28</date><risdate>2007</risdate><abstract>The invention relates to a matrix liquid for producing machining suspensions, a machining suspension produced with the matrix and a method of fractionating the used machining suspension yielded after use. The invention also relates to a homogeneous mixture of a polymer or various polymers and water. The mixture can be used especially advantageously in all technical applications requiring a liquid with lubricating properties. In the present invention, a mixture of water and a thickening agent, respectively a polymer or a multiplicity of polymers, is utilized as the matrix liquid or lubricating liquid. The cutting grains can be separated very easily and quickly from the used machining suspension produced with this matrix liquid; for reuse. Less process water is required and the process water can be simply purified as there is no complicated getting rid of an alcohol charge.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng ; fre ; ger |
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| subjects | ADHESIVES CHEMISTRY DRESSING OR CONDITIONING OF ABRADING SURFACES DYES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS FUELS GRINDING LUBRICANTS LUBRICATING COMPOSITIONS MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PEAT PERFORMING OPERATIONS PETROLEUM, GAS OR COKE INDUSTRIES POLISHES POLISHING POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SKI WAXES TECHNICAL GASES CONTAINING CARBON MONOXIDE TRANSPORTING USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATINGINGREDIENTS IN A LUBRICATING COMPOSITION WORKING CEMENT, CLAY, OR STONE WORKING STONE OR STONE-LIKE MATERIALS |
| title | MATRIX LIQUID FOR PRODUCING A CHIP REMOVAL SUSPENSION, AND USED AS A LUBRICATING OR MACHINING LIQUID |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-19T13%3A02%3A04IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=EISNER,%20PETER&rft.date=2007-02-28&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EEP1756253A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |