HIGH-REFLECTING DIELECTRIC MIRROR AND METHOD FOR THE PRODUCTION THEREOF
The invention relates to high-reflecting dielectric mirrors for selected wavelengths ranging from 170 nm to 230 nm. The aim of the invention is to create better adherence of the dielectric layers, particularly on a low-cost substrate, to avoid the formation of fractures in the dielectric layers, to...
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| creator | FASOLD, DIETER BERNITZKI, HELMUT KLAUS, MICHAEL LAUX, SVEN |
| description | The invention relates to high-reflecting dielectric mirrors for selected wavelengths ranging from 170 nm to 230 nm. The aim of the invention is to create better adherence of the dielectric layers, particularly on a low-cost substrate, to avoid the formation of fractures in the dielectric layers, to increase laser resistance and minimize losses. The dielectric layers form a first stack of alternating high and low refractive oxidic layers and a second stack of alternating high and low refractive fluoridic layers, wherein the first stack is arranged on the optical substrate and the second stack is arranged on the first stack. Compression stress is present in the high and low refractive layers of the first stack and is used to compensate tensile stress in the fluoridic layers. |
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| subjects | OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS |
| title | HIGH-REFLECTING DIELECTRIC MIRROR AND METHOD FOR THE PRODUCTION THEREOF |
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