LASER MULTIPLEXING

A laser multiplexing system and method for use with high power pulsed lasers in Extreme Ultraviolet Lithography is disclosed. In a first embodiment, a high power EUV laser multiplexing element for laser produced plasma generation has a compound lens with at least two focusing elements arranged to fo...

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Hauptverfasser: ELLWI, SAMIR SHAKIR, HENRY, MATTHEW, COMLEY, ANDREW JAMES, HAY, NICK
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Sprache:eng ; fre ; ger
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creator ELLWI, SAMIR SHAKIR
HENRY, MATTHEW
COMLEY, ANDREW JAMES
HAY, NICK
description A laser multiplexing system and method for use with high power pulsed lasers in Extreme Ultraviolet Lithography is disclosed. In a first embodiment, a high power EUV laser multiplexing element for laser produced plasma generation has a compound lens with at least two focusing elements arranged to focus at least two respective laser beams to a focal point on a common workpiece. In a second embodiment, a laser multiplexing apparatus has at least two pulsed laser sources for generating pulsed laser beams and a temporal multiplexing element arranged to temporally interleave at least two pulsed laser beams. In a third embodiment, a laser multiplexing assembly comprises a beam shaping element in which the beam shaping element is arranged to direct a first laser beam along an axis common with a second laser beam axis onto a common focusing element arranged about the common axis.
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In a first embodiment, a high power EUV laser multiplexing element for laser produced plasma generation has a compound lens with at least two focusing elements arranged to focus at least two respective laser beams to a focal point on a common workpiece. In a second embodiment, a laser multiplexing apparatus has at least two pulsed laser sources for generating pulsed laser beams and a temporal multiplexing element arranged to temporally interleave at least two pulsed laser beams. In a third embodiment, a laser multiplexing assembly comprises a beam shaping element in which the beam shaping element is arranged to direct a first laser beam along an axis common with a second laser beam axis onto a common focusing element arranged about the common axis.</description><language>eng ; fre ; ger</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; CLADDING OR PLATING BY SOLDERING OR WELDING ; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING ; DEVICES USING STIMULATED EMISSION ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MACHINE TOOLS ; MATERIALS THEREFOR ; METAL-WORKING NOT OTHERWISE PROVIDED FOR ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORIGINALS THEREFOR ; PERFORMING OPERATIONS ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SOLDERING OR UNSOLDERING ; TRANSPORTING ; WELDING ; WORKING BY LASER BEAM ; X-RAY TECHNIQUE</subject><creationdate>2006</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20061108&amp;DB=EPODOC&amp;CC=EP&amp;NR=1719218A2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20061108&amp;DB=EPODOC&amp;CC=EP&amp;NR=1719218A2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ELLWI, SAMIR SHAKIR</creatorcontrib><creatorcontrib>HENRY, MATTHEW</creatorcontrib><creatorcontrib>COMLEY, ANDREW JAMES</creatorcontrib><creatorcontrib>HAY, NICK</creatorcontrib><title>LASER MULTIPLEXING</title><description>A laser multiplexing system and method for use with high power pulsed lasers in Extreme Ultraviolet Lithography is disclosed. 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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
CLADDING OR PLATING BY SOLDERING OR WELDING
CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING
DEVICES USING STIMULATED EMISSION
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MACHINE TOOLS
MATERIALS THEREFOR
METAL-WORKING NOT OTHERWISE PROVIDED FOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SOLDERING OR UNSOLDERING
TRANSPORTING
WELDING
WORKING BY LASER BEAM
X-RAY TECHNIQUE
title LASER MULTIPLEXING
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