Method of cleaning a substrate surface from a crystal nucleus

The present invention provides a method of cleaning a substrate surface (1a) from a crystal nucleus (11) in which the substrate surface (1a) is held in a condition under which a crystal growth is accelerated with respect to normal clean room and normal air conditions. In particular, light (3a) havin...

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1. Verfasser:	CHOVINO, CHRISTIAN
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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creator	CHOVINO, CHRISTIAN
description	The present invention provides a method of cleaning a substrate surface (1a) from a crystal nucleus (11) in which the substrate surface (1a) is held in a condition under which a crystal growth is accelerated with respect to normal clean room and normal air conditions. In particular, light (3a) having a wavelength so as to induce a crystal (11a) growth is irradiated, and, additionally, at least one reactive gas (12) is fed at a higher concentration than under normal clean room and normal air conditions. After placing the substrate under these conditions, the grown crystals (11a) are removed, for example by rinsing with water. As a consequence, the crystal nucleus is removed from the substrate surface.
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fullrecord	<record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP1710623A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP1710623A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP1710623A13</originalsourceid><addsrcrecordid>eNrjZLD1TS3JyE9RyE9TSM5JTczLzEtXSFQoLk0qLilKLEkFsorSEpNTFdKK8nOBEslFlcUliTkKeaVA1aXFPAysaYk5xam8UJqbQcHNNcTZQze1ID8-tbgAqDMvtSTeNcDQ3NDAzMjY0dCYCCUAol0viA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Method of cleaning a substrate surface from a crystal nucleus</title><source>esp@cenet</source><creator>CHOVINO, CHRISTIAN</creator><creatorcontrib>CHOVINO, CHRISTIAN</creatorcontrib><description>The present invention provides a method of cleaning a substrate surface (1a) from a crystal nucleus (11) in which the substrate surface (1a) is held in a condition under which a crystal growth is accelerated with respect to normal clean room and normal air conditions. In particular, light (3a) having a wavelength so as to induce a crystal (11a) growth is irradiated, and, additionally, at least one reactive gas (12) is fed at a higher concentration than under normal clean room and normal air conditions. After placing the substrate under these conditions, the grown crystals (11a) are removed, for example by rinsing with water. As a consequence, the crystal nucleus is removed from the substrate surface.</description><language>eng ; fre ; ger</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2006</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20061011&DB=EPODOC&CC=EP&NR=1710623A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20061011&DB=EPODOC&CC=EP&NR=1710623A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CHOVINO, CHRISTIAN</creatorcontrib><title>Method of cleaning a substrate surface from a crystal nucleus</title><description>The present invention provides a method of cleaning a substrate surface (1a) from a crystal nucleus (11) in which the substrate surface (1a) is held in a condition under which a crystal growth is accelerated with respect to normal clean room and normal air conditions. In particular, light (3a) having a wavelength so as to induce a crystal (11a) growth is irradiated, and, additionally, at least one reactive gas (12) is fed at a higher concentration than under normal clean room and normal air conditions. After placing the substrate under these conditions, the grown crystals (11a) are removed, for example by rinsing with water. As a consequence, the crystal nucleus is removed from the substrate surface.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2006</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLD1TS3JyE9RyE9TSM5JTczLzEtXSFQoLk0qLilKLEkFsorSEpNTFdKK8nOBEslFlcUliTkKeaVA1aXFPAysaYk5xam8UJqbQcHNNcTZQze1ID8-tbgAqDMvtSTeNcDQ3NDAzMjY0dCYCCUAol0viA</recordid><startdate>20061011</startdate><enddate>20061011</enddate><creator>CHOVINO, CHRISTIAN</creator><scope>EVB</scope></search><sort><creationdate>20061011</creationdate><title>Method of cleaning a substrate surface from a crystal nucleus</title><author>CHOVINO, CHRISTIAN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP1710623A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2006</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>CHOVINO, CHRISTIAN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CHOVINO, CHRISTIAN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method of cleaning a substrate surface from a crystal nucleus</title><date>2006-10-11</date><risdate>2006</risdate><abstract>The present invention provides a method of cleaning a substrate surface (1a) from a crystal nucleus (11) in which the substrate surface (1a) is held in a condition under which a crystal growth is accelerated with respect to normal clean room and normal air conditions. In particular, light (3a) having a wavelength so as to induce a crystal (11a) growth is irradiated, and, additionally, at least one reactive gas (12) is fed at a higher concentration than under normal clean room and normal air conditions. After placing the substrate under these conditions, the grown crystals (11a) are removed, for example by rinsing with water. As a consequence, the crystal nucleus is removed from the substrate surface.</abstract><oa>free_for_read</oa></addata></record>
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language	eng ; fre ; ger
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subjects	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
title	Method of cleaning a substrate surface from a crystal nucleus
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