METHODS FOR IMPROVING FLOW THROUGH FLUIDIC CHANNELS

A method for improving fluidic flow for a microfluidic device having a through hole or slot therein. The method includes the steps of forming one or more openings through at least part of a thickness of a substrate from a first surface to an opposite second surface using a reactive ion etching proce...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: MRVOS, JAMES, M, MONEY, CHRISTOPHER, J, MCNEES, ANDREW, L, VANDERPOOL, JASON, T, HAMMOND, CORY, N, KARTHIK, VAIDEESWARAN, PATIL, GIRISH, S, WILLIAMS, GARY, R, WARNER, RICHARD, L, KRAWCZYK, JOHN, W, DOERRE, MARK, L
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator MRVOS, JAMES, M
MONEY, CHRISTOPHER, J
MCNEES, ANDREW, L
VANDERPOOL, JASON, T
HAMMOND, CORY, N
KARTHIK, VAIDEESWARAN
PATIL, GIRISH, S
WILLIAMS, GARY, R
WARNER, RICHARD, L
KRAWCZYK, JOHN, W
DOERRE, MARK, L
description A method for improving fluidic flow for a microfluidic device having a through hole or slot therein. The method includes the steps of forming one or more openings through at least part of a thickness of a substrate from a first surface to an opposite second surface using a reactive ion etching process whereby an etch stop layer is applied to side wall surfaces in the one or more openings during alternating etching and passivating steps as the openings are etched through at least a portion of the substrate. Substantially all of the etch stop layer coating is removed from the side wall surfaces by treating the side wall surfaces using a method selected from chemical treatment and mechanical treatment, whereby a surface energy of the treated side wall surfaces is increased relative to a surface energy of the side wall surfaces containing the etch stop layer coating.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP1689589A2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP1689589A2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP1689589A23</originalsourceid><addsrcrecordid>eNrjZDD2dQ3x8HcJVnDzD1Lw9A0I8g_z9HNXcPPxD1cI8QjyD3X3AHJCPV08nRWcPRz9_Fx9gnkYWNMSc4pTeaE0N4OCm2uIs4duakF-fGpxQWJyal5qSbxrgKGZhaWphaWjkTERSgBnsSb7</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>METHODS FOR IMPROVING FLOW THROUGH FLUIDIC CHANNELS</title><source>esp@cenet</source><creator>MRVOS, JAMES, M ; MONEY, CHRISTOPHER, J ; MCNEES, ANDREW, L ; VANDERPOOL, JASON, T ; HAMMOND, CORY, N ; KARTHIK, VAIDEESWARAN ; PATIL, GIRISH, S ; WILLIAMS, GARY, R ; WARNER, RICHARD, L ; KRAWCZYK, JOHN, W ; DOERRE, MARK, L</creator><creatorcontrib>MRVOS, JAMES, M ; MONEY, CHRISTOPHER, J ; MCNEES, ANDREW, L ; VANDERPOOL, JASON, T ; HAMMOND, CORY, N ; KARTHIK, VAIDEESWARAN ; PATIL, GIRISH, S ; WILLIAMS, GARY, R ; WARNER, RICHARD, L ; KRAWCZYK, JOHN, W ; DOERRE, MARK, L</creatorcontrib><description>A method for improving fluidic flow for a microfluidic device having a through hole or slot therein. The method includes the steps of forming one or more openings through at least part of a thickness of a substrate from a first surface to an opposite second surface using a reactive ion etching process whereby an etch stop layer is applied to side wall surfaces in the one or more openings during alternating etching and passivating steps as the openings are etched through at least a portion of the substrate. Substantially all of the etch stop layer coating is removed from the side wall surfaces by treating the side wall surfaces using a method selected from chemical treatment and mechanical treatment, whereby a surface energy of the treated side wall surfaces is increased relative to a surface energy of the side wall surfaces containing the etch stop layer coating.</description><language>eng ; fre ; ger</language><subject>ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVEREDIN A SINGLE OTHER SUBCLASS ; CORRECTION OF TYPOGRAPHICAL ERRORS ; i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME ; LINING MACHINES ; MEASURING ; MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE ; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR ; PERFORMING OPERATIONS ; PHYSICS ; PRINTING ; SELECTIVE PRINTING MECHANISMS ; STAMPS ; TARIFF METERING APPARATUS ; TESTING ; TRANSPORTING ; TYPEWRITERS</subject><creationdate>2006</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20060816&amp;DB=EPODOC&amp;CC=EP&amp;NR=1689589A2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20060816&amp;DB=EPODOC&amp;CC=EP&amp;NR=1689589A2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MRVOS, JAMES, M</creatorcontrib><creatorcontrib>MONEY, CHRISTOPHER, J</creatorcontrib><creatorcontrib>MCNEES, ANDREW, L</creatorcontrib><creatorcontrib>VANDERPOOL, JASON, T</creatorcontrib><creatorcontrib>HAMMOND, CORY, N</creatorcontrib><creatorcontrib>KARTHIK, VAIDEESWARAN</creatorcontrib><creatorcontrib>PATIL, GIRISH, S</creatorcontrib><creatorcontrib>WILLIAMS, GARY, R</creatorcontrib><creatorcontrib>WARNER, RICHARD, L</creatorcontrib><creatorcontrib>KRAWCZYK, JOHN, W</creatorcontrib><creatorcontrib>DOERRE, MARK, L</creatorcontrib><title>METHODS FOR IMPROVING FLOW THROUGH FLUIDIC CHANNELS</title><description>A method for improving fluidic flow for a microfluidic device having a through hole or slot therein. The method includes the steps of forming one or more openings through at least part of a thickness of a substrate from a first surface to an opposite second surface using a reactive ion etching process whereby an etch stop layer is applied to side wall surfaces in the one or more openings during alternating etching and passivating steps as the openings are etched through at least a portion of the substrate. Substantially all of the etch stop layer coating is removed from the side wall surfaces by treating the side wall surfaces using a method selected from chemical treatment and mechanical treatment, whereby a surface energy of the treated side wall surfaces is increased relative to a surface energy of the side wall surfaces containing the etch stop layer coating.</description><subject>ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVEREDIN A SINGLE OTHER SUBCLASS</subject><subject>CORRECTION OF TYPOGRAPHICAL ERRORS</subject><subject>i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME</subject><subject>LINING MACHINES</subject><subject>MEASURING</subject><subject>MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE</subject><subject>MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICS</subject><subject>PRINTING</subject><subject>SELECTIVE PRINTING MECHANISMS</subject><subject>STAMPS</subject><subject>TARIFF METERING APPARATUS</subject><subject>TESTING</subject><subject>TRANSPORTING</subject><subject>TYPEWRITERS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2006</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDD2dQ3x8HcJVnDzD1Lw9A0I8g_z9HNXcPPxD1cI8QjyD3X3AHJCPV08nRWcPRz9_Fx9gnkYWNMSc4pTeaE0N4OCm2uIs4duakF-fGpxQWJyal5qSbxrgKGZhaWphaWjkTERSgBnsSb7</recordid><startdate>20060816</startdate><enddate>20060816</enddate><creator>MRVOS, JAMES, M</creator><creator>MONEY, CHRISTOPHER, J</creator><creator>MCNEES, ANDREW, L</creator><creator>VANDERPOOL, JASON, T</creator><creator>HAMMOND, CORY, N</creator><creator>KARTHIK, VAIDEESWARAN</creator><creator>PATIL, GIRISH, S</creator><creator>WILLIAMS, GARY, R</creator><creator>WARNER, RICHARD, L</creator><creator>KRAWCZYK, JOHN, W</creator><creator>DOERRE, MARK, L</creator><scope>EVB</scope></search><sort><creationdate>20060816</creationdate><title>METHODS FOR IMPROVING FLOW THROUGH FLUIDIC CHANNELS</title><author>MRVOS, JAMES, M ; MONEY, CHRISTOPHER, J ; MCNEES, ANDREW, L ; VANDERPOOL, JASON, T ; HAMMOND, CORY, N ; KARTHIK, VAIDEESWARAN ; PATIL, GIRISH, S ; WILLIAMS, GARY, R ; WARNER, RICHARD, L ; KRAWCZYK, JOHN, W ; DOERRE, MARK, L</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP1689589A23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2006</creationdate><topic>ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVEREDIN A SINGLE OTHER SUBCLASS</topic><topic>CORRECTION OF TYPOGRAPHICAL ERRORS</topic><topic>i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME</topic><topic>LINING MACHINES</topic><topic>MEASURING</topic><topic>MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE</topic><topic>MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICS</topic><topic>PRINTING</topic><topic>SELECTIVE PRINTING MECHANISMS</topic><topic>STAMPS</topic><topic>TARIFF METERING APPARATUS</topic><topic>TESTING</topic><topic>TRANSPORTING</topic><topic>TYPEWRITERS</topic><toplevel>online_resources</toplevel><creatorcontrib>MRVOS, JAMES, M</creatorcontrib><creatorcontrib>MONEY, CHRISTOPHER, J</creatorcontrib><creatorcontrib>MCNEES, ANDREW, L</creatorcontrib><creatorcontrib>VANDERPOOL, JASON, T</creatorcontrib><creatorcontrib>HAMMOND, CORY, N</creatorcontrib><creatorcontrib>KARTHIK, VAIDEESWARAN</creatorcontrib><creatorcontrib>PATIL, GIRISH, S</creatorcontrib><creatorcontrib>WILLIAMS, GARY, R</creatorcontrib><creatorcontrib>WARNER, RICHARD, L</creatorcontrib><creatorcontrib>KRAWCZYK, JOHN, W</creatorcontrib><creatorcontrib>DOERRE, MARK, L</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MRVOS, JAMES, M</au><au>MONEY, CHRISTOPHER, J</au><au>MCNEES, ANDREW, L</au><au>VANDERPOOL, JASON, T</au><au>HAMMOND, CORY, N</au><au>KARTHIK, VAIDEESWARAN</au><au>PATIL, GIRISH, S</au><au>WILLIAMS, GARY, R</au><au>WARNER, RICHARD, L</au><au>KRAWCZYK, JOHN, W</au><au>DOERRE, MARK, L</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHODS FOR IMPROVING FLOW THROUGH FLUIDIC CHANNELS</title><date>2006-08-16</date><risdate>2006</risdate><abstract>A method for improving fluidic flow for a microfluidic device having a through hole or slot therein. The method includes the steps of forming one or more openings through at least part of a thickness of a substrate from a first surface to an opposite second surface using a reactive ion etching process whereby an etch stop layer is applied to side wall surfaces in the one or more openings during alternating etching and passivating steps as the openings are etched through at least a portion of the substrate. Substantially all of the etch stop layer coating is removed from the side wall surfaces by treating the side wall surfaces using a method selected from chemical treatment and mechanical treatment, whereby a surface energy of the treated side wall surfaces is increased relative to a surface energy of the side wall surfaces containing the etch stop layer coating.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng ; fre ; ger
recordid cdi_epo_espacenet_EP1689589A2
source esp@cenet
subjects ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVEREDIN A SINGLE OTHER SUBCLASS
CORRECTION OF TYPOGRAPHICAL ERRORS
i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME
LINING MACHINES
MEASURING
MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE
MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
PERFORMING OPERATIONS
PHYSICS
PRINTING
SELECTIVE PRINTING MECHANISMS
STAMPS
TARIFF METERING APPARATUS
TESTING
TRANSPORTING
TYPEWRITERS
title METHODS FOR IMPROVING FLOW THROUGH FLUIDIC CHANNELS
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-30T01%3A43%3A47IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=MRVOS,%20JAMES,%20M&rft.date=2006-08-16&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EEP1689589A2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true