LOW-ACTIVATION ENERGY SILICON-CONTAINING RESIST SYSTEM
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| creator | KWONG, RANEE, W ALLEN, ROBERT, D HUANG, WU-SONG SOORIYAKUMARAN, RATNAM ANGELOPOULOS, MARIE |
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| language | eng ; fre ; ger |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR AUXILIARY PROCESSES IN PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS |
| title | LOW-ACTIVATION ENERGY SILICON-CONTAINING RESIST SYSTEM |
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