Inductively coupled plasma processing apparatus

An inductively coupled plasma processing apparatus (100) comprises a plasma chamber (12) with a dielectric window (400) forming a self-supporting wall element of the plasma chamber (12). The dielectric window (400) has an external and an internal side with respect to the chamber (12). An electromagn...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	COLPO, PASCAL, ROSSI, FRANCOIS, FENDLER, REINHARD
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
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