PROCESS FOR THE PREPARATION OF METAL OXIDE COATED ORGANIC MATERIAL BY MICROWAVE DEPOSITION

A process for the preparation of organic material comprising an organic substrate and at least one dielectric layer consisting of one or more oxides of a metal selected from groups 3 to 15 of the periodic table, which comprises the steps of: (a) suspending the organic material in an aqueous solution...

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Bibliographische Detailangaben
Hauptverfasser:	PASTOR, STEPHEN, DANIEL, XIONG, RONG, BUJARD, PATRICE
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	ADHESIVES CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL DYES INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS POLISHES PREPARATION OF CARBON BLACK SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS,TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES
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Beschreibung
Zusammenfassung:	A process for the preparation of organic material comprising an organic substrate and at least one dielectric layer consisting of one or more oxides of a metal selected from groups 3 to 15 of the periodic table, which comprises the steps of: (a) suspending the organic material in an aqueous solution of fluorine scavenger; (b) adding an aqueous solution of one or more fluorine containing metal complexes which are the precursors of the desired metal oxide coating; and (c) subjecting said suspension to microwave radiation to deposit the metal oxide onto said organic material, wherein steps (b) and (c) can optionally be repeated using different fluorine containing metal complexes to produce one or more metal oxide layers. The substrate can be optionally dissolved with solvent to yield free metal oxide or mixed metal oxides that have a plane-parallel structure.