Method and apparatus for thermal development with development medium remover
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| creator | MCMILLEN, ROBERT A KANNURPATTI, ANANDKUMAR R DUDEK, DIETMAR HACKLER, MARK A TRAINOR, JOHN W |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP1624343B1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP1624343B1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP1624343B13</originalsourceid><addsrcrecordid>eNrjZPDxTS3JyE9RSMwD4oKCxKLEktJihbT8IoWSjNSi3MQchZTUstSc_ILc1LwShfLMkgwUgdzUlMzSXIWi1Nz8stQiHgbWtMSc4lReKM3NoODmGuLsoZtakB-fWlyQmJyal1oS7xpgaGZkYmxi7GRoTIQSAHO8Ngc</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Method and apparatus for thermal development with development medium remover</title><source>esp@cenet</source><creator>MCMILLEN, ROBERT A ; KANNURPATTI, ANANDKUMAR R ; DUDEK, DIETMAR ; HACKLER, MARK A ; TRAINOR, JOHN W</creator><creatorcontrib>MCMILLEN, ROBERT A ; KANNURPATTI, ANANDKUMAR R ; DUDEK, DIETMAR ; HACKLER, MARK A ; TRAINOR, JOHN W</creatorcontrib><language>eng ; fre ; ger</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2012</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20120411&DB=EPODOC&CC=EP&NR=1624343B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20120411&DB=EPODOC&CC=EP&NR=1624343B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MCMILLEN, ROBERT A</creatorcontrib><creatorcontrib>KANNURPATTI, ANANDKUMAR R</creatorcontrib><creatorcontrib>DUDEK, DIETMAR</creatorcontrib><creatorcontrib>HACKLER, MARK A</creatorcontrib><creatorcontrib>TRAINOR, JOHN W</creatorcontrib><title>Method and apparatus for thermal development with development medium remover</title><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2012</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPDxTS3JyE9RSMwD4oKCxKLEktJihbT8IoWSjNSi3MQchZTUstSc_ILc1LwShfLMkgwUgdzUlMzSXIWi1Nz8stQiHgbWtMSc4lReKM3NoODmGuLsoZtakB-fWlyQmJyal1oS7xpgaGZkYmxi7GRoTIQSAHO8Ngc</recordid><startdate>20120411</startdate><enddate>20120411</enddate><creator>MCMILLEN, ROBERT A</creator><creator>KANNURPATTI, ANANDKUMAR R</creator><creator>DUDEK, DIETMAR</creator><creator>HACKLER, MARK A</creator><creator>TRAINOR, JOHN W</creator><scope>EVB</scope></search><sort><creationdate>20120411</creationdate><title>Method and apparatus for thermal development with development medium remover</title><author>MCMILLEN, ROBERT A ; KANNURPATTI, ANANDKUMAR R ; DUDEK, DIETMAR ; HACKLER, MARK A ; TRAINOR, JOHN W</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP1624343B13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2012</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>MCMILLEN, ROBERT A</creatorcontrib><creatorcontrib>KANNURPATTI, ANANDKUMAR R</creatorcontrib><creatorcontrib>DUDEK, DIETMAR</creatorcontrib><creatorcontrib>HACKLER, MARK A</creatorcontrib><creatorcontrib>TRAINOR, JOHN W</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MCMILLEN, ROBERT A</au><au>KANNURPATTI, ANANDKUMAR R</au><au>DUDEK, DIETMAR</au><au>HACKLER, MARK A</au><au>TRAINOR, JOHN W</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method and apparatus for thermal development with development medium remover</title><date>2012-04-11</date><risdate>2012</risdate><oa>free_for_read</oa></addata></record> |
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| language | eng ; fre ; ger |
| recordid | cdi_epo_espacenet_EP1624343B1 |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Method and apparatus for thermal development with development medium remover |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-03T13%3A40%3A56IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=MCMILLEN,%20ROBERT%20A&rft.date=2012-04-11&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EEP1624343B1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |