APPARATUS AND METHOD FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY

Disclosed are techniques, apparatus, and targets for determining overlay error between two layers of a sample. A plurality of targets is provided. Each target includes a portion of the first and second structures and each is designed to have an offset between its first and second structure portions....

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ADEL, MICHAEL, GROSS, KENNETH P, WACK, DAN, MOSHE, BARUCH, FRIEDMANN, MICHAEL, BAREKET, NOAH, FABRIKANT, ANATOLY, BEVIS, CHRISTOPHER, F, ZALICKI, PIOTR, GOLOVANEVSKY, BORIS, KNOLL, NOAM, FIELDEN, JOHN, SMITH, IAN, DECECCO, PAOLA, MIEHER, WALTER, D, LEVY, ADY, GHINOVKER, MARK
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING
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