CONTINUOUS DIRECT-WRITE OPTICAL LITHOGRAPHY

An optical lithography system (100) comprises a light source (110), a spatial light modulator (120), imaging optics (130) and means for continuously moving a photosensitive substrate (140) relative to the spatial light modulator. The spatial light modulator comprises at least one array of individual...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	MEISBURGER, WILLIAM DANIEL
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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