CONTINUOUS DIRECT-WRITE OPTICAL LITHOGRAPHY

An optical lithography system (100) comprises a light source (110), a spatial light modulator (120), imaging optics (130) and means for continuously moving a photosensitive substrate (140) relative to the spatial light modulator. The spatial light modulator comprises at least one array of individual...

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description An optical lithography system (100) comprises a light source (110), a spatial light modulator (120), imaging optics (130) and means for continuously moving a photosensitive substrate (140) relative to the spatial light modulator. The spatial light modulator comprises at least one array of individually switchable elements. The spatial light modulator is continuously illuminated and an image of the spatial light modulator is continuously projected on the substrate; consequently, the image is constantly moving across the surface of the substrate. While the image is moving across the surface, elements of the spatial light modulator are switched such that a pixel on the surface of the substrate receives, in serial, doses of energy from multiple elements of the spatial light modulator, thus forming a latent image on the substrate surface. The imaging optics is configured to project a blurred image of the spatial light modulator on the substrate, enabling sub-pixel resolution feature edge placement.
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language eng ; fre ; ger
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
title CONTINUOUS DIRECT-WRITE OPTICAL LITHOGRAPHY
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