FABRICATION OF 3D PHOTOPOLYMERIC DEVICES

A process and apparatus for making polymeric layers. A layer of liquid ( 20 ) including a photopolymerizable precursor is formed between a substrate ( 17 ) and a photomask ( 12 ). A reaction chamber is formed by a base ( 15 ), side walls ( 16 ) and photomask ( 12 ) polymerizes one or more regions of...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	ANSETH, KRISTI, HARALDSSON, K., TOMMY, HUTCHISON, J., BRIAN, BOWMAN, CHRISTOPHER
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICALDEVICES MICROSTRUCTURAL TECHNOLOGY ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	A process and apparatus for making polymeric layers. A layer of liquid ( 20 ) including a photopolymerizable precursor is formed between a substrate ( 17 ) and a photomask ( 12 ). A reaction chamber is formed by a base ( 15 ), side walls ( 16 ) and photomask ( 12 ) polymerizes one or more regions of the liquid layer ( 20 ) to form a polymeric layer.