Method for depositing thin layers on a substrate in a height-adjustable process chamber
The invention relates to a method and a device for depositing thin layers on a substrate in a process chamber (4) arranged in a reactor housing (1, 2, 3), the bottom of said process chamber consisting of a temperable substrate holder (5) which can be rotatably driven about its vertical axis (6), and...
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Sprache: | eng ; fre ; ger |
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