Vacuum Evaporator
A vacuum evaporator according to the present invention comprises a vacuum chamber (1), a rod-like evaporation source (2) provided to be liftable into and out of the vacuum chamber, and a work support means (3) for supporting, works (W) arranged to surround, the evaporation source. The vacuum chamber...
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| creator | KAWAGUCHI, HIROSHI FUJII, HIROFUMI SHIMOJIMA KATUHIKO |
| description | A vacuum evaporator according to the present invention comprises a vacuum chamber (1), a rod-like evaporation source (2) provided to be liftable into and out of the vacuum chamber, and a work support means (3) for supporting, works (W) arranged to surround, the evaporation source. The vacuum chamber is formed of a fixed chamber part (6) and a movable chamber part (7a,7b) provided connectably to and disconnectably from the fixed chamber part and mounted with the work support means. Either one movable chamber part is horizontally moved and connected to the fixed chamber part in the state where the evaporation source is raised and retreated out of the vacuum chamber to perform vacuum evaporation treatment. The vacuum chamber has a body part cylindrical as the whole, an upper plate (52) for blocking an upper opening of said body part and a lower plate (53) for blocking a lower opening of said body part, wherein said fixed chamber part includes a center portion passing the axis of the vacuum chamber in said upper plate, and said movable chamber part includes a center portion passing the axis of the vacuum chamber in said lower plate, and wherein said fixed chamber part and movable chamber part are divided by a dividing plane (DP) passing the center portion of said body part. |
| format | Patent |
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The vacuum chamber is formed of a fixed chamber part (6) and a movable chamber part (7a,7b) provided connectably to and disconnectably from the fixed chamber part and mounted with the work support means. Either one movable chamber part is horizontally moved and connected to the fixed chamber part in the state where the evaporation source is raised and retreated out of the vacuum chamber to perform vacuum evaporation treatment. The vacuum chamber has a body part cylindrical as the whole, an upper plate (52) for blocking an upper opening of said body part and a lower plate (53) for blocking a lower opening of said body part, wherein said fixed chamber part includes a center portion passing the axis of the vacuum chamber in said upper plate, and said movable chamber part includes a center portion passing the axis of the vacuum chamber in said lower plate, and wherein said fixed chamber part and movable chamber part are divided by a dividing plane (DP) passing the center portion of said body part.</description><language>eng ; fre ; ger</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2011</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20110921&DB=EPODOC&CC=EP&NR=1496136B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20110921&DB=EPODOC&CC=EP&NR=1496136B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KAWAGUCHI, HIROSHI</creatorcontrib><creatorcontrib>FUJII, HIROFUMI</creatorcontrib><creatorcontrib>SHIMOJIMA KATUHIKO</creatorcontrib><title>Vacuum Evaporator</title><description>A vacuum evaporator according to the present invention comprises a vacuum chamber (1), a rod-like evaporation source (2) provided to be liftable into and out of the vacuum chamber, and a work support means (3) for supporting, works (W) arranged to surround, the evaporation source. The vacuum chamber is formed of a fixed chamber part (6) and a movable chamber part (7a,7b) provided connectably to and disconnectably from the fixed chamber part and mounted with the work support means. Either one movable chamber part is horizontally moved and connected to the fixed chamber part in the state where the evaporation source is raised and retreated out of the vacuum chamber to perform vacuum evaporation treatment. The vacuum chamber has a body part cylindrical as the whole, an upper plate (52) for blocking an upper opening of said body part and a lower plate (53) for blocking a lower opening of said body part, wherein said fixed chamber part includes a center portion passing the axis of the vacuum chamber in said upper plate, and said movable chamber part includes a center portion passing the axis of the vacuum chamber in said lower plate, and wherein said fixed chamber part and movable chamber part are divided by a dividing plane (DP) passing the center portion of said body part.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2011</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBAMS0wuLc1VcC1LLMgvSizJL-JhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfGuAYYmlmaGxmZOhsZEKAEAnCcfUg</recordid><startdate>20110921</startdate><enddate>20110921</enddate><creator>KAWAGUCHI, HIROSHI</creator><creator>FUJII, HIROFUMI</creator><creator>SHIMOJIMA KATUHIKO</creator><scope>EVB</scope></search><sort><creationdate>20110921</creationdate><title>Vacuum Evaporator</title><author>KAWAGUCHI, HIROSHI ; FUJII, HIROFUMI ; SHIMOJIMA KATUHIKO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP1496136B13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2011</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>KAWAGUCHI, HIROSHI</creatorcontrib><creatorcontrib>FUJII, HIROFUMI</creatorcontrib><creatorcontrib>SHIMOJIMA KATUHIKO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KAWAGUCHI, HIROSHI</au><au>FUJII, HIROFUMI</au><au>SHIMOJIMA KATUHIKO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Vacuum Evaporator</title><date>2011-09-21</date><risdate>2011</risdate><abstract>A vacuum evaporator according to the present invention comprises a vacuum chamber (1), a rod-like evaporation source (2) provided to be liftable into and out of the vacuum chamber, and a work support means (3) for supporting, works (W) arranged to surround, the evaporation source. The vacuum chamber is formed of a fixed chamber part (6) and a movable chamber part (7a,7b) provided connectably to and disconnectably from the fixed chamber part and mounted with the work support means. Either one movable chamber part is horizontally moved and connected to the fixed chamber part in the state where the evaporation source is raised and retreated out of the vacuum chamber to perform vacuum evaporation treatment. The vacuum chamber has a body part cylindrical as the whole, an upper plate (52) for blocking an upper opening of said body part and a lower plate (53) for blocking a lower opening of said body part, wherein said fixed chamber part includes a center portion passing the axis of the vacuum chamber in said upper plate, and said movable chamber part includes a center portion passing the axis of the vacuum chamber in said lower plate, and wherein said fixed chamber part and movable chamber part are divided by a dividing plane (DP) passing the center portion of said body part.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng ; fre ; ger |
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| subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | Vacuum Evaporator |
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