METHOD OF MANUFACTURING NANOWIRES AND ELECTRONIC DEVICE

In the method, semiconductor substrates are etched to provide nanowires, said substrates comprising a first layer of a first material and a second layer of a second material with a mutual interface, which first and second materials are different. They may be different in the doping type. Alternative...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: VERHOEVEN, Johannes, F., C., M, BAKKERS, Erik, P., A., M, ROOZEBOOM, Freddy, VAN DER SLUIS, Paul
Format: Patent
Sprache:eng ; fre ; ger
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