IMAGING DEVICE IN A PROJECTION EXPOSURE FACILITY

An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable rel...

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Hauptverfasser: RIEF, KLAUS, SCHOENGART, STEFAN, RASSEL, THORSTEN, RAOUL, REINER, HOLDERER, HUBERT, LIPPERT, JOHANNES, FISCHER, JUERGEN, MUEHLBEYER, MICHAEL, NEUMAIER, MARKUS, MERZ, ERICH, WEBER, ULRICH, WEBER, JOCHEN, HUMMEL, WOLFGANG, AUBELE, KARL-EUGEN, TROSSBACH, BAERBEL, KOHL, ALEXANDER
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Sprache:eng ; fre ; ger
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creator RIEF, KLAUS
SCHOENGART, STEFAN
RASSEL, THORSTEN
RAOUL, REINER
HOLDERER, HUBERT
LIPPERT, JOHANNES
FISCHER, JUERGEN
MUEHLBEYER, MICHAEL
NEUMAIER, MARKUS
MERZ, ERICH
WEBER, ULRICH
WEBER, JOCHEN
HUMMEL, WOLFGANG
AUBELE, KARL-EUGEN
TROSSBACH, BAERBEL
KOHL, ALEXANDER
description An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
title IMAGING DEVICE IN A PROJECTION EXPOSURE FACILITY
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