Alignment systems and methods for lithographic systems
An alignment system for a lithographic apparatus has a source of alignment radiation, a detection system that has a first detector channel and a second detector channel, and a position determining unit in communication with the detection system. The position determining unit processes information fr...
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| creator | VAN HORSSEN, HERMANUS GERARDUS SIMONS, HUBERTUS JOHANNES GERTRUDUS SCHETS, SICCO IAN JEUNINK, ANDRE BERNARDUS MEGENS, HENRY TOLSMA, HOITE PIETER THEODOOR VAN BILSEN, FRANCISCUS BERNARDUS MARIA NAVARRO Y KOREN, RAMON VAN HAREN, RICHARD JOHANNES FRANCISCUS BURGHOORN, JACOBUS HUIJBREGTSE, JEROEN SCHUURHUIS, JOHNY RUTGER LEE, BRIAN VAN HINNEN, PAUL CHRISTIAAN DUNBAR, ALLAN |
| description | An alignment system for a lithographic apparatus has a source of alignment radiation, a detection system that has a first detector channel and a second detector channel, and a position determining unit in communication with the detection system. The position determining unit processes information from the first and second detector channels in combination to determine a position of an alignment mark on a first object relative to a reference position on a second object based on the combined information. |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Alignment systems and methods for lithographic systems |
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