Alignment systems and methods for lithographic systems

An alignment system for a lithographic apparatus has a source of alignment radiation, a detection system that has a first detector channel and a second detector channel, and a position determining unit in communication with the detection system. The position determining unit processes information fr...

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Bibliographische Detailangaben
Hauptverfasser:	VAN HORSSEN, HERMANUS GERARDUS, SIMONS, HUBERTUS JOHANNES GERTRUDUS, SCHETS, SICCO IAN, JEUNINK, ANDRE BERNARDUS, MEGENS, HENRY, TOLSMA, HOITE PIETER THEODOOR, VAN BILSEN, FRANCISCUS BERNARDUS MARIA, NAVARRO Y KOREN, RAMON, VAN HAREN, RICHARD JOHANNES FRANCISCUS, BURGHOORN, JACOBUS, HUIJBREGTSE, JEROEN, SCHUURHUIS, JOHNY RUTGER, LEE, BRIAN, VAN HINNEN, PAUL CHRISTIAAN, DUNBAR, ALLAN
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	An alignment system for a lithographic apparatus has a source of alignment radiation, a detection system that has a first detector channel and a second detector channel, and a position determining unit in communication with the detection system. The position determining unit processes information from the first and second detector channels in combination to determine a position of an alignment mark on a first object relative to a reference position on a second object based on the combined information.