RAPID THERMAL PROCESSING SYSTEM FOR INTEGRATED CIRCUITS

In a rapid thermal processing system an array of heat lamps generate radiant heat for heating the surfaces of a semiconductor substrate, such as a semiconductor wafer, to a selected temperature or set of temperatures while held within an enclosed chamber. The heat lamps are surrounded individually o...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HAUF, MARKUS, TAY, SING-PIN, HU, YAO, ZHI
Format: Patent
Sprache:eng ; fre ; ger
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