MULTIPLE TORCH - MULTIPLE TARGET METHOD AND APPARATUS FOR PLASMA OUTSIDE CHEMICAL VAPOR DEPOSITION

A plurality of glass deposition targets are rotated simultaneously and a first plasma torch, having a coil diameter larger than the sum of the target diameters, deposits glass simultaneously on the plurality. After the diameter of the targets reaches a threshold a second plasma torch is used. The di...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	WU, DAU, DANILOV, EVGUENIE, B, GOUSKOV, MIKHAIL, I, ASLAMI, MOHD, A
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CHEMISTRY GLASS MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES METALLURGY MINERAL OR SLAG WOOL
Online-Zugang:	Volltext bestellen
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