A REACTOR FOR PLASMA ASSISTED TREATMENT OF GASEOUS
A plasma reactor ( 11 ) of the silent discharge or dielectric barrier type for treatment of a gaseous medium is provided with a layer of material ( 34 ) positioned to present a surface extending along at least part of the length of the gas flow path. Particulates or selected species are entrapped on...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | A plasma reactor ( 11 ) of the silent discharge or dielectric barrier type for treatment of a gaseous medium is provided with a layer of material ( 34 ) positioned to present a surface extending along at least part of the length of the gas flow path. Particulates or selected species are entrapped on the surface. A preferred electrode arrangement provides surface discharge in the plasma at the surface of the layer of material. |
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