A REACTOR FOR PLASMA ASSISTED TREATMENT OF GASEOUS

A plasma reactor ( 11 ) of the silent discharge or dielectric barrier type for treatment of a gaseous medium is provided with a layer of material ( 34 ) positioned to present a surface extending along at least part of the length of the gas flow path. Particulates or selected species are entrapped on...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: SHAWCROSS, James Timothy, NG, Ka Lok, CARLOW, John Sydney
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A plasma reactor ( 11 ) of the silent discharge or dielectric barrier type for treatment of a gaseous medium is provided with a layer of material ( 34 ) positioned to present a surface extending along at least part of the length of the gas flow path. Particulates or selected species are entrapped on the surface. A preferred electrode arrangement provides surface discharge in the plasma at the surface of the layer of material.