Linear filament array sheet for EUV production
An EUV radiation source (12) that generates a sheet (36) of a liquid target material that has a width that matches the desired laser spot size (28) for good conversion efficiency and a thickness that matches the laser beam/target interaction depth. The EUV source (12) includes a reservoir (10) conta...
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| creator | ORSINI, ROCCO A PETACH, MICHAEL B |
| description | An EUV radiation source (12) that generates a sheet (36) of a liquid target material that has a width that matches the desired laser spot size (28) for good conversion efficiency and a thickness that matches the laser beam/target interaction depth. The EUV source (12) includes a reservoir (10) containing a pressurized cryogenic liquid target material, such as liquid Xenon. The reservoir (10) also includes an array (14) of closely spaced orifices (16). The liquid target material is forced through the orifices (16) into a vacuum chamber as separated liquid stream filaments (20) of the target material that define the sheet (36). The liquid streams freeze to form an array of frozen target filaments (20). A laser beam (24) is directed to a target area (28) in the vacuum chamber where it irradiates the stream of filaments (20) to create a plasma (30) that emits EUV radiation (32). |
| format | Patent |
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The EUV source (12) includes a reservoir (10) containing a pressurized cryogenic liquid target material, such as liquid Xenon. The reservoir (10) also includes an array (14) of closely spaced orifices (16). The liquid target material is forced through the orifices (16) into a vacuum chamber as separated liquid stream filaments (20) of the target material that define the sheet (36). The liquid streams freeze to form an array of frozen target filaments (20). A laser beam (24) is directed to a target area (28) in the vacuum chamber where it irradiates the stream of filaments (20) to create a plasma (30) that emits EUV radiation (32).</description><edition>7</edition><language>eng ; fre ; ger</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; GAMMA RAY OR X-RAY MICROSCOPES ; HOLOGRAPHY ; IRRADIATION DEVICES ; MATERIALS THEREFOR ; NUCLEAR ENGINEERING ; NUCLEAR PHYSICS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS ; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS ; SEMICONDUCTOR DEVICES ; TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR ; X-RAY TECHNIQUE</subject><creationdate>2003</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20031203&DB=EPODOC&CC=EP&NR=1367445A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,781,886,25569,76552</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20031203&DB=EPODOC&CC=EP&NR=1367445A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ORSINI, ROCCO A</creatorcontrib><creatorcontrib>PETACH, MICHAEL B</creatorcontrib><title>Linear filament array sheet for EUV production</title><description>An EUV radiation source (12) that generates a sheet (36) of a liquid target material that has a width that matches the desired laser spot size (28) for good conversion efficiency and a thickness that matches the laser beam/target interaction depth. 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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GAMMA RAY OR X-RAY MICROSCOPES HOLOGRAPHY IRRADIATION DEVICES MATERIALS THEREFOR NUCLEAR ENGINEERING NUCLEAR PHYSICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEMICONDUCTOR DEVICES TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR X-RAY TECHNIQUE |
| title | Linear filament array sheet for EUV production |
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