CERAMIC ELECTRONIC DEVICE AND METHOD OF PRODUCTION OF SAME

A method of production of a ceramic electronic device such as a multilayer ceramic capacitor, comprising forming a first ceramic coating layer on the surface of a substrate, forming an internal electrode on the surface of the first ceramic coating layer, then forming a second ceramic coating layer o...

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Hauptverfasser: Izumibe, Yasushi, Ishida, Hitoshi, Saitoh, Akira, Ueda, Kaname, Kobayashi, Ryou
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Sprache:eng ; fre ; ger
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creator Izumibe, Yasushi
Ishida, Hitoshi
Saitoh, Akira
Ueda, Kaname
Kobayashi, Ryou
description A method of production of a ceramic electronic device such as a multilayer ceramic capacitor, comprising forming a first ceramic coating layer on the surface of a substrate, forming an internal electrode on the surface of the first ceramic coating layer, then forming a second ceramic coating layer on the surface of the first ceramic coating layer so as to cover the internal electrode. In this case, when a mean particle size of ceramic particles of the first ceramic coating layer is ±1, a thickness of the first ceramic coating layer is T1, a mean particle size of ceramic particles of the second ceramic coating layer is ±2, and a thickness of the second ceramic coating layer is T2, the conditions of ±1‰¤±2, 0.05
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In this case, when a mean particle size of ceramic particles of the first ceramic coating layer is ±1, a thickness of the first ceramic coating layer is T1, a mean particle size of ceramic particles of the second ceramic coating layer is ±2, and a thickness of the second ceramic coating layer is T2, the conditions of ±1‰¤±2, 0.05&lt;±1‰¤0.35 µm, T1&lt;T2, and 0&lt;T1&lt;1.5 µm are satisfied. 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In this case, when a mean particle size of ceramic particles of the first ceramic coating layer is ±1, a thickness of the first ceramic coating layer is T1, a mean particle size of ceramic particles of the second ceramic coating layer is ±2, and a thickness of the second ceramic coating layer is T2, the conditions of ±1‰¤±2, 0.05&lt;±1‰¤0.35 µm, T1&lt;T2, and 0&lt;T1&lt;1.5 µm are satisfied. 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language eng ; fre ; ger
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subjects BASIC ELECTRIC ELEMENTS
CAPACITORS
CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES ORLIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
LAYERED PRODUCTS
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
PERFORMING OPERATIONS
PLASMA TECHNIQUE
PRINTED CIRCUITS
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
SEMICONDUCTOR DEVICES
TRANSPORTING
title CERAMIC ELECTRONIC DEVICE AND METHOD OF PRODUCTION OF SAME
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