PATTERNED DEPOSITION USING COMPRESSED CARBON DIOXIDE
A method for the patterned deposition of a material comprises the steps of dissolving or suspending said material in a solvent phase comprising compressed carbon dioxide, and depositing the solution or suspension onto a surface, evaporation of the solvent phase leaving a patterned deposit of said ma...
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creator | AL-DURI, BUSHRA LU, TIEJUN HUCK, WILHELM T S SEVILLE, JONATHAN HOLMES, ANDREW B SANTOS, REGINA LEEKE, GARY GASPAR, FILIPE LUSCOMBE, CHRISTINE K |
description | A method for the patterned deposition of a material comprises the steps of dissolving or suspending said material in a solvent phase comprising compressed carbon dioxide, and depositing the solution or suspension onto a surface, evaporation of the solvent phase leaving a patterned deposit of said material. This method is particularly suitable for the patterned deposition of polymers and small organic molecules in organic light emitting diodes and organic transistors. |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP1341616B1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP1341616B1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP1341616B13</originalsourceid><addsrcrecordid>eNrjZDAJcAwJcQ3yc3VRcHEN8A_2DPH091MIDfb0c1dw9vcNCHINDgbKOTsGOQHFXTz9IzxdXHkYWNMSc4pTeaE0N4OCm2uIs4duakF-fGpxQWJyal5qSbxrgKGxiaGZoZmToTERSgCXkCcs</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>PATTERNED DEPOSITION USING COMPRESSED CARBON DIOXIDE</title><source>esp@cenet</source><creator>AL-DURI, BUSHRA ; LU, TIEJUN ; HUCK, WILHELM T S ; SEVILLE, JONATHAN ; HOLMES, ANDREW B ; SANTOS, REGINA ; LEEKE, GARY ; GASPAR, FILIPE ; LUSCOMBE, CHRISTINE K</creator><creatorcontrib>AL-DURI, BUSHRA ; LU, TIEJUN ; HUCK, WILHELM T S ; SEVILLE, JONATHAN ; HOLMES, ANDREW B ; SANTOS, REGINA ; LEEKE, GARY ; GASPAR, FILIPE ; LUSCOMBE, CHRISTINE K</creatorcontrib><description>A method for the patterned deposition of a material comprises the steps of dissolving or suspending said material in a solvent phase comprising compressed carbon dioxide, and depositing the solution or suspension onto a surface, evaporation of the solvent phase leaving a patterned deposit of said material. This method is particularly suitable for the patterned deposition of polymers and small organic molecules in organic light emitting diodes and organic transistors.</description><edition>7</edition><language>eng ; fre ; ger</language><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ; BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; PERFORMING OPERATIONS ; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL ; SEMICONDUCTOR DEVICES ; SPRAYING OR ATOMISING IN GENERAL ; TRANSPORTING</subject><creationdate>2005</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20050615&DB=EPODOC&CC=EP&NR=1341616B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20050615&DB=EPODOC&CC=EP&NR=1341616B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>AL-DURI, BUSHRA</creatorcontrib><creatorcontrib>LU, TIEJUN</creatorcontrib><creatorcontrib>HUCK, WILHELM T S</creatorcontrib><creatorcontrib>SEVILLE, JONATHAN</creatorcontrib><creatorcontrib>HOLMES, ANDREW B</creatorcontrib><creatorcontrib>SANTOS, REGINA</creatorcontrib><creatorcontrib>LEEKE, GARY</creatorcontrib><creatorcontrib>GASPAR, FILIPE</creatorcontrib><creatorcontrib>LUSCOMBE, CHRISTINE K</creatorcontrib><title>PATTERNED DEPOSITION USING COMPRESSED CARBON DIOXIDE</title><description>A method for the patterned deposition of a material comprises the steps of dissolving or suspending said material in a solvent phase comprising compressed carbon dioxide, and depositing the solution or suspension onto a surface, evaporation of the solvent phase leaving a patterned deposit of said material. This method is particularly suitable for the patterned deposition of polymers and small organic molecules in organic light emitting diodes and organic transistors.</description><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>PERFORMING OPERATIONS</subject><subject>PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SPRAYING OR ATOMISING IN GENERAL</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2005</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDAJcAwJcQ3yc3VRcHEN8A_2DPH091MIDfb0c1dw9vcNCHINDgbKOTsGOQHFXTz9IzxdXHkYWNMSc4pTeaE0N4OCm2uIs4duakF-fGpxQWJyal5qSbxrgKGxiaGZoZmToTERSgCXkCcs</recordid><startdate>20050615</startdate><enddate>20050615</enddate><creator>AL-DURI, BUSHRA</creator><creator>LU, TIEJUN</creator><creator>HUCK, WILHELM T S</creator><creator>SEVILLE, JONATHAN</creator><creator>HOLMES, ANDREW B</creator><creator>SANTOS, REGINA</creator><creator>LEEKE, GARY</creator><creator>GASPAR, FILIPE</creator><creator>LUSCOMBE, CHRISTINE K</creator><scope>EVB</scope></search><sort><creationdate>20050615</creationdate><title>PATTERNED DEPOSITION USING COMPRESSED CARBON DIOXIDE</title><author>AL-DURI, BUSHRA ; LU, TIEJUN ; HUCK, WILHELM T S ; SEVILLE, JONATHAN ; HOLMES, ANDREW B ; SANTOS, REGINA ; LEEKE, GARY ; GASPAR, FILIPE ; LUSCOMBE, CHRISTINE K</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP1341616B13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2005</creationdate><topic>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>PERFORMING OPERATIONS</topic><topic>PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SPRAYING OR ATOMISING IN GENERAL</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>AL-DURI, BUSHRA</creatorcontrib><creatorcontrib>LU, TIEJUN</creatorcontrib><creatorcontrib>HUCK, WILHELM T S</creatorcontrib><creatorcontrib>SEVILLE, JONATHAN</creatorcontrib><creatorcontrib>HOLMES, ANDREW B</creatorcontrib><creatorcontrib>SANTOS, REGINA</creatorcontrib><creatorcontrib>LEEKE, GARY</creatorcontrib><creatorcontrib>GASPAR, FILIPE</creatorcontrib><creatorcontrib>LUSCOMBE, CHRISTINE K</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>AL-DURI, BUSHRA</au><au>LU, TIEJUN</au><au>HUCK, WILHELM T S</au><au>SEVILLE, JONATHAN</au><au>HOLMES, ANDREW B</au><au>SANTOS, REGINA</au><au>LEEKE, GARY</au><au>GASPAR, FILIPE</au><au>LUSCOMBE, CHRISTINE K</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PATTERNED DEPOSITION USING COMPRESSED CARBON DIOXIDE</title><date>2005-06-15</date><risdate>2005</risdate><abstract>A method for the patterned deposition of a material comprises the steps of dissolving or suspending said material in a solvent phase comprising compressed carbon dioxide, and depositing the solution or suspension onto a surface, evaporation of the solvent phase leaving a patterned deposit of said material. This method is particularly suitable for the patterned deposition of polymers and small organic molecules in organic light emitting diodes and organic transistors.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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subjects | APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SEMICONDUCTOR DEVICES SPRAYING OR ATOMISING IN GENERAL TRANSPORTING |
title | PATTERNED DEPOSITION USING COMPRESSED CARBON DIOXIDE |
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