A method to fabricate RF inductors with minimum area

A method to fabricate RF inductors with minimum area

A method for forming an RF inductor of helical shape having high Q and minimum area. The inductor is fabricated of metal or damascened linear segments formed on three levels of intermetal dielectric layers and interconnected by metal filled vias to form the complete helical shape with electrical con...

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Hauptverfasser: SEE, ALEX, LEE, TAE JONG, TEE, CHUA CHEE, CHA, RANDALL, CHAN, LAP
Format: Patent
Sprache:eng ; fre ; ger
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BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INDUCTANCES
MAGNETS
SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
SEMICONDUCTOR DEVICES
TRANSFORMERS
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creator SEE, ALEX
LEE, TAE JONG
TEE, CHUA CHEE
CHA, RANDALL
CHAN, LAP
description A method for forming an RF inductor of helical shape having high Q and minimum area. The inductor is fabricated of metal or damascened linear segments formed on three levels of intermetal dielectric layers and interconnected by metal filled vias to form the complete helical shape with electrical continuity.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP1267391B1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP1267391B1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP1267391B13</originalsourceid><addsrcrecordid>eNrjZDBxVMhNLcnIT1EoyVdIS0wqykxOLElVCHJTyMxLKU0uyS8qVijPLMlQyM3My8wtzVVILEpN5GFgTUvMKU7lhdLcDApuriHOHrqpBfnxqcUFicmpeakl8a4BhkZm5saWhk6GxkQoAQCKbivJ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>A method to fabricate RF inductors with minimum area</title><source>esp@cenet</source><creator>SEE, ALEX ; LEE, TAE JONG ; TEE, CHUA CHEE ; CHA, RANDALL ; CHAN, LAP</creator><creatorcontrib>SEE, ALEX ; LEE, TAE JONG ; TEE, CHUA CHEE ; CHA, RANDALL ; CHAN, LAP</creatorcontrib><description>A method for forming an RF inductor of helical shape having high Q and minimum area. The inductor is fabricated of metal or damascened linear segments formed on three levels of intermetal dielectric layers and interconnected by metal filled vias to form the complete helical shape with electrical continuity.</description><language>eng ; fre ; ger</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INDUCTANCES ; MAGNETS ; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES ; SEMICONDUCTOR DEVICES ; TRANSFORMERS</subject><creationdate>2007</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20070725&amp;DB=EPODOC&amp;CC=EP&amp;NR=1267391B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20070725&amp;DB=EPODOC&amp;CC=EP&amp;NR=1267391B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SEE, ALEX</creatorcontrib><creatorcontrib>LEE, TAE JONG</creatorcontrib><creatorcontrib>TEE, CHUA CHEE</creatorcontrib><creatorcontrib>CHA, RANDALL</creatorcontrib><creatorcontrib>CHAN, LAP</creatorcontrib><title>A method to fabricate RF inductors with minimum area</title><description>A method for forming an RF inductor of helical shape having high Q and minimum area. The inductor is fabricated of metal or damascened linear segments formed on three levels of intermetal dielectric layers and interconnected by metal filled vias to form the complete helical shape with electrical continuity.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INDUCTANCES</subject><subject>MAGNETS</subject><subject>SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TRANSFORMERS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2007</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDBxVMhNLcnIT1EoyVdIS0wqykxOLElVCHJTyMxLKU0uyS8qVijPLMlQyM3My8wtzVVILEpN5GFgTUvMKU7lhdLcDApuriHOHrqpBfnxqcUFicmpeakl8a4BhkZm5saWhk6GxkQoAQCKbivJ</recordid><startdate>20070725</startdate><enddate>20070725</enddate><creator>SEE, ALEX</creator><creator>LEE, TAE JONG</creator><creator>TEE, CHUA CHEE</creator><creator>CHA, RANDALL</creator><creator>CHAN, LAP</creator><scope>EVB</scope></search><sort><creationdate>20070725</creationdate><title>A method to fabricate RF inductors with minimum area</title><author>SEE, ALEX ; LEE, TAE JONG ; TEE, CHUA CHEE ; CHA, RANDALL ; CHAN, LAP</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP1267391B13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2007</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INDUCTANCES</topic><topic>MAGNETS</topic><topic>SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TRANSFORMERS</topic><toplevel>online_resources</toplevel><creatorcontrib>SEE, ALEX</creatorcontrib><creatorcontrib>LEE, TAE JONG</creatorcontrib><creatorcontrib>TEE, CHUA CHEE</creatorcontrib><creatorcontrib>CHA, RANDALL</creatorcontrib><creatorcontrib>CHAN, LAP</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SEE, ALEX</au><au>LEE, TAE JONG</au><au>TEE, CHUA CHEE</au><au>CHA, RANDALL</au><au>CHAN, LAP</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>A method to fabricate RF inductors with minimum area</title><date>2007-07-25</date><risdate>2007</risdate><abstract>A method for forming an RF inductor of helical shape having high Q and minimum area. The inductor is fabricated of metal or damascened linear segments formed on three levels of intermetal dielectric layers and interconnected by metal filled vias to form the complete helical shape with electrical continuity.</abstract><oa>free_for_read</oa></addata></record>
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INDUCTANCES
MAGNETS
SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
SEMICONDUCTOR DEVICES
TRANSFORMERS
title A method to fabricate RF inductors with minimum area
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-14T17%3A05%3A38IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=SEE,%20ALEX&rft.date=2007-07-25&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EEP1267391B1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true