A method to fabricate RF inductors with minimum area

A method for forming an RF inductor of helical shape having high Q and minimum area. The inductor is fabricated of metal or damascened linear segments formed on three levels of intermetal dielectric layers and interconnected by metal filled vias to form the complete helical shape with electrical con...

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Bibliographische Detailangaben
Hauptverfasser:	SEE, ALEX, LEE, TAE JONG, TEE, CHUA CHEE, CHA, RANDALL, CHAN, LAP
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INDUCTANCES MAGNETS SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES SEMICONDUCTOR DEVICES TRANSFORMERS
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Beschreibung
Zusammenfassung:	A method for forming an RF inductor of helical shape having high Q and minimum area. The inductor is fabricated of metal or damascened linear segments formed on three levels of intermetal dielectric layers and interconnected by metal filled vias to form the complete helical shape with electrical continuity.