Microchannel device, method for producing the microchannel device and use of the same
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creator | NISHIZAWA, KEIICHIRO FUTAMI, TORU HAYASHI, TOSHINORI KATAYAMA, KOJI TAKANA, TSUYOSHI KAWAI, AKIRA |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP1250954A3</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP1250954A3</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP1250954A33</originalsourceid><addsrcrecordid>eNrjZAj1zUwuyk_OSMzLS81RSEkty0xO1VHITS3JyE9RSMsvUigoyk8pTc7MS1coyUhVyMVUrZCYl6JQWpyqkJ8GVlKcmJvKw8CalphTnMoLpbkZFNxcQ5w9dFML8uNTiwsSk1PzUkviXQMMjUwNLE1NHI2NiVACADbeOD4</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Microchannel device, method for producing the microchannel device and use of the same</title><source>esp@cenet</source><creator>NISHIZAWA, KEIICHIRO ; FUTAMI, TORU ; HAYASHI, TOSHINORI ; KATAYAMA, KOJI ; TAKANA, TSUYOSHI ; KAWAI, AKIRA</creator><creatorcontrib>NISHIZAWA, KEIICHIRO ; FUTAMI, TORU ; HAYASHI, TOSHINORI ; KATAYAMA, KOJI ; TAKANA, TSUYOSHI ; KAWAI, AKIRA</creatorcontrib><edition>7</edition><language>eng ; fre ; ger</language><subject>AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING ; CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE ; INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULARARTICLES ; MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICALDEVICES ; MICROSTRUCTURAL TECHNOLOGY ; PERFORMING OPERATIONS ; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL ; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR ; SHAPING OR JOINING OF PLASTICS ; TRANSPORTING ; WORKING OF PLASTICS ; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL</subject><creationdate>2004</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20040331&DB=EPODOC&CC=EP&NR=1250954A3$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20040331&DB=EPODOC&CC=EP&NR=1250954A3$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>NISHIZAWA, KEIICHIRO</creatorcontrib><creatorcontrib>FUTAMI, TORU</creatorcontrib><creatorcontrib>HAYASHI, TOSHINORI</creatorcontrib><creatorcontrib>KATAYAMA, KOJI</creatorcontrib><creatorcontrib>TAKANA, TSUYOSHI</creatorcontrib><creatorcontrib>KAWAI, AKIRA</creatorcontrib><title>Microchannel device, method for producing the microchannel device and use of the same</title><subject>AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING</subject><subject>CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE</subject><subject>INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULARARTICLES</subject><subject>MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICALDEVICES</subject><subject>MICROSTRUCTURAL TECHNOLOGY</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</subject><subject>SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR</subject><subject>SHAPING OR JOINING OF PLASTICS</subject><subject>TRANSPORTING</subject><subject>WORKING OF PLASTICS</subject><subject>WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2004</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZAj1zUwuyk_OSMzLS81RSEkty0xO1VHITS3JyE9RSMsvUigoyk8pTc7MS1coyUhVyMVUrZCYl6JQWpyqkJ8GVlKcmJvKw8CalphTnMoLpbkZFNxcQ5w9dFML8uNTiwsSk1PzUkviXQMMjUwNLE1NHI2NiVACADbeOD4</recordid><startdate>20040331</startdate><enddate>20040331</enddate><creator>NISHIZAWA, KEIICHIRO</creator><creator>FUTAMI, TORU</creator><creator>HAYASHI, TOSHINORI</creator><creator>KATAYAMA, KOJI</creator><creator>TAKANA, TSUYOSHI</creator><creator>KAWAI, AKIRA</creator><scope>EVB</scope></search><sort><creationdate>20040331</creationdate><title>Microchannel device, method for producing the microchannel device and use of the same</title><author>NISHIZAWA, KEIICHIRO ; FUTAMI, TORU ; HAYASHI, TOSHINORI ; KATAYAMA, KOJI ; TAKANA, TSUYOSHI ; KAWAI, AKIRA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP1250954A33</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2004</creationdate><topic>AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING</topic><topic>CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE</topic><topic>INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULARARTICLES</topic><topic>MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICALDEVICES</topic><topic>MICROSTRUCTURAL TECHNOLOGY</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</topic><topic>SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR</topic><topic>SHAPING OR JOINING OF PLASTICS</topic><topic>TRANSPORTING</topic><topic>WORKING OF PLASTICS</topic><topic>WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL</topic><toplevel>online_resources</toplevel><creatorcontrib>NISHIZAWA, KEIICHIRO</creatorcontrib><creatorcontrib>FUTAMI, TORU</creatorcontrib><creatorcontrib>HAYASHI, TOSHINORI</creatorcontrib><creatorcontrib>KATAYAMA, KOJI</creatorcontrib><creatorcontrib>TAKANA, TSUYOSHI</creatorcontrib><creatorcontrib>KAWAI, AKIRA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>NISHIZAWA, KEIICHIRO</au><au>FUTAMI, TORU</au><au>HAYASHI, TOSHINORI</au><au>KATAYAMA, KOJI</au><au>TAKANA, TSUYOSHI</au><au>KAWAI, AKIRA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Microchannel device, method for producing the microchannel device and use of the same</title><date>2004-03-31</date><risdate>2004</risdate><edition>7</edition><oa>free_for_read</oa></addata></record> |
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subjects | AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULARARTICLES MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICALDEVICES MICROSTRUCTURAL TECHNOLOGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL |
title | Microchannel device, method for producing the microchannel device and use of the same |
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