Six axes positioning system with a space free from magnetic field
Arrangement for positioning wafers within apparatus for illumination or measurement of the wafer using radiation in high vacuum conditions. The arrangement comprises a linear guide (3) along which a wafer support system (4) can be moved in a vertical direction. The device also has drives for limited...
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creator | KIRSCHSTEIN, ULF GRAMSCH, TORSTEN SAFFERT, EUGEN BECKERT, ERIK HOFFMANN, ANDREW ZENTNER, JOHANNES SCHAEFFEL, CHRISTOPH |
description | Arrangement for positioning wafers within apparatus for illumination or measurement of the wafer using radiation in high vacuum conditions. The arrangement comprises a linear guide (3) along which a wafer support system (4) can be moved in a vertical direction. The device also has drives for limited alteration of the slope of the guide, for limited rotation of the drive and for displacement of the linear guide and support in either X, Y or Z directions. |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP1189018A3</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP1189018A3</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP1189018A33</originalsourceid><addsrcrecordid>eNrjZHAMzqxQSKxILVYoyC_OLMnMz8vMS1coriwuSc1VKM8syVBIVCguSExOVUgrSgUR-bkKuYnpeaklmckKaZmpOSk8DKxpiTnFqbxQmptBwc01xNlDN7UgPz4VrBeoOt41wNDQwtLA0MLR2JgIJQCSYjEU</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Six axes positioning system with a space free from magnetic field</title><source>esp@cenet</source><creator>KIRSCHSTEIN, ULF ; GRAMSCH, TORSTEN ; SAFFERT, EUGEN ; BECKERT, ERIK ; HOFFMANN, ANDREW ; ZENTNER, JOHANNES ; SCHAEFFEL, CHRISTOPH</creator><creatorcontrib>KIRSCHSTEIN, ULF ; GRAMSCH, TORSTEN ; SAFFERT, EUGEN ; BECKERT, ERIK ; HOFFMANN, ANDREW ; ZENTNER, JOHANNES ; SCHAEFFEL, CHRISTOPH</creatorcontrib><description>Arrangement for positioning wafers within apparatus for illumination or measurement of the wafer using radiation in high vacuum conditions. The arrangement comprises a linear guide (3) along which a wafer support system (4) can be moved in a vertical direction. The device also has drives for limited alteration of the slope of the guide, for limited rotation of the drive and for displacement of the linear guide and support in either X, Y or Z directions.</description><edition>7</edition><language>eng ; fre ; ger</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2003</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20030402&DB=EPODOC&CC=EP&NR=1189018A3$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20030402&DB=EPODOC&CC=EP&NR=1189018A3$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KIRSCHSTEIN, ULF</creatorcontrib><creatorcontrib>GRAMSCH, TORSTEN</creatorcontrib><creatorcontrib>SAFFERT, EUGEN</creatorcontrib><creatorcontrib>BECKERT, ERIK</creatorcontrib><creatorcontrib>HOFFMANN, ANDREW</creatorcontrib><creatorcontrib>ZENTNER, JOHANNES</creatorcontrib><creatorcontrib>SCHAEFFEL, CHRISTOPH</creatorcontrib><title>Six axes positioning system with a space free from magnetic field</title><description>Arrangement for positioning wafers within apparatus for illumination or measurement of the wafer using radiation in high vacuum conditions. The arrangement comprises a linear guide (3) along which a wafer support system (4) can be moved in a vertical direction. The device also has drives for limited alteration of the slope of the guide, for limited rotation of the drive and for displacement of the linear guide and support in either X, Y or Z directions.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2003</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHAMzqxQSKxILVYoyC_OLMnMz8vMS1coriwuSc1VKM8syVBIVCguSExOVUgrSgUR-bkKuYnpeaklmckKaZmpOSk8DKxpiTnFqbxQmptBwc01xNlDN7UgPz4VrBeoOt41wNDQwtLA0MLR2JgIJQCSYjEU</recordid><startdate>20030402</startdate><enddate>20030402</enddate><creator>KIRSCHSTEIN, ULF</creator><creator>GRAMSCH, TORSTEN</creator><creator>SAFFERT, EUGEN</creator><creator>BECKERT, ERIK</creator><creator>HOFFMANN, ANDREW</creator><creator>ZENTNER, JOHANNES</creator><creator>SCHAEFFEL, CHRISTOPH</creator><scope>EVB</scope></search><sort><creationdate>20030402</creationdate><title>Six axes positioning system with a space free from magnetic field</title><author>KIRSCHSTEIN, ULF ; GRAMSCH, TORSTEN ; SAFFERT, EUGEN ; BECKERT, ERIK ; HOFFMANN, ANDREW ; ZENTNER, JOHANNES ; SCHAEFFEL, CHRISTOPH</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP1189018A33</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2003</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>KIRSCHSTEIN, ULF</creatorcontrib><creatorcontrib>GRAMSCH, TORSTEN</creatorcontrib><creatorcontrib>SAFFERT, EUGEN</creatorcontrib><creatorcontrib>BECKERT, ERIK</creatorcontrib><creatorcontrib>HOFFMANN, ANDREW</creatorcontrib><creatorcontrib>ZENTNER, JOHANNES</creatorcontrib><creatorcontrib>SCHAEFFEL, CHRISTOPH</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KIRSCHSTEIN, ULF</au><au>GRAMSCH, TORSTEN</au><au>SAFFERT, EUGEN</au><au>BECKERT, ERIK</au><au>HOFFMANN, ANDREW</au><au>ZENTNER, JOHANNES</au><au>SCHAEFFEL, CHRISTOPH</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Six axes positioning system with a space free from magnetic field</title><date>2003-04-02</date><risdate>2003</risdate><abstract>Arrangement for positioning wafers within apparatus for illumination or measurement of the wafer using radiation in high vacuum conditions. The arrangement comprises a linear guide (3) along which a wafer support system (4) can be moved in a vertical direction. The device also has drives for limited alteration of the slope of the guide, for limited rotation of the drive and for displacement of the linear guide and support in either X, Y or Z directions.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
title | Six axes positioning system with a space free from magnetic field |
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