Six axes positioning system with a space free from magnetic field

Arrangement for positioning wafers within apparatus for illumination or measurement of the wafer using radiation in high vacuum conditions. The arrangement comprises a linear guide (3) along which a wafer support system (4) can be moved in a vertical direction. The device also has drives for limited...

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Hauptverfasser: KIRSCHSTEIN, ULF, GRAMSCH, TORSTEN, SAFFERT, EUGEN, BECKERT, ERIK, HOFFMANN, ANDREW, ZENTNER, JOHANNES, SCHAEFFEL, CHRISTOPH
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creator KIRSCHSTEIN, ULF
GRAMSCH, TORSTEN
SAFFERT, EUGEN
BECKERT, ERIK
HOFFMANN, ANDREW
ZENTNER, JOHANNES
SCHAEFFEL, CHRISTOPH
description Arrangement for positioning wafers within apparatus for illumination or measurement of the wafer using radiation in high vacuum conditions. The arrangement comprises a linear guide (3) along which a wafer support system (4) can be moved in a vertical direction. The device also has drives for limited alteration of the slope of the guide, for limited rotation of the drive and for displacement of the linear guide and support in either X, Y or Z directions.
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
title Six axes positioning system with a space free from magnetic field
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