MICROSCOPE, ESPECIALLY MICROSCOPE USED FOR INSPECTION IN SEMICONDUCTOR MANUFACTURE
A microscope, especially a microscope that is used for inspection in semiconductor manufacture is disclosed. The microscope comprises a pulsed laser for the purpose of illumination, preferably in the UV range. At least one rotating diffusion disk is disposed downstream of the laser so as to homogeni...
Gespeichert in:
Hauptverfasser: | , , |
---|---|
Format: | Patent |
Sprache: | eng ; fre ; ger |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | ENGEL, THOMAS HARNISCH, WOLFGANG SCHELER, ROLAND |
description | A microscope, especially a microscope that is used for inspection in semiconductor manufacture is disclosed. The microscope comprises a pulsed laser for the purpose of illumination, preferably in the UV range. At least one rotating diffusion disk is disposed downstream of the laser so as to homogenize the illumination. Preferably, two rotating diffusion disks of opposite rotational sense are disposed in the illumination beam path either directly or indirectly one behind the other. |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP1131665A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP1131665A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP1131665A13</originalsourceid><addsrcrecordid>eNrjZAjy9XQO8g929g9w1VFwDQ5wdfZ09PGJVEAIK4QGu7oouPkHKXj6geRDPP39gEyFYFegGn8_l1DnEKCcr6NfqJujc0hokCsPA2taYk5xKi-U5mZQcHMNcfbQTS3Ij08tLkhMTs1LLYl3DTA0NDY0MzN1NDQmQgkAo0svkw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>MICROSCOPE, ESPECIALLY MICROSCOPE USED FOR INSPECTION IN SEMICONDUCTOR MANUFACTURE</title><source>esp@cenet</source><creator>ENGEL, THOMAS ; HARNISCH, WOLFGANG ; SCHELER, ROLAND</creator><creatorcontrib>ENGEL, THOMAS ; HARNISCH, WOLFGANG ; SCHELER, ROLAND</creatorcontrib><description>A microscope, especially a microscope that is used for inspection in semiconductor manufacture is disclosed. The microscope comprises a pulsed laser for the purpose of illumination, preferably in the UV range. At least one rotating diffusion disk is disposed downstream of the laser so as to homogenize the illumination. Preferably, two rotating diffusion disks of opposite rotational sense are disposed in the illumination beam path either directly or indirectly one behind the other.</description><edition>7</edition><language>eng ; fre ; ger</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2001</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20010912&DB=EPODOC&CC=EP&NR=1131665A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20010912&DB=EPODOC&CC=EP&NR=1131665A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ENGEL, THOMAS</creatorcontrib><creatorcontrib>HARNISCH, WOLFGANG</creatorcontrib><creatorcontrib>SCHELER, ROLAND</creatorcontrib><title>MICROSCOPE, ESPECIALLY MICROSCOPE USED FOR INSPECTION IN SEMICONDUCTOR MANUFACTURE</title><description>A microscope, especially a microscope that is used for inspection in semiconductor manufacture is disclosed. The microscope comprises a pulsed laser for the purpose of illumination, preferably in the UV range. At least one rotating diffusion disk is disposed downstream of the laser so as to homogenize the illumination. Preferably, two rotating diffusion disks of opposite rotational sense are disposed in the illumination beam path either directly or indirectly one behind the other.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2001</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZAjy9XQO8g929g9w1VFwDQ5wdfZ09PGJVEAIK4QGu7oouPkHKXj6geRDPP39gEyFYFegGn8_l1DnEKCcr6NfqJujc0hokCsPA2taYk5xKi-U5mZQcHMNcfbQTS3Ij08tLkhMTs1LLYl3DTA0NDY0MzN1NDQmQgkAo0svkw</recordid><startdate>20010912</startdate><enddate>20010912</enddate><creator>ENGEL, THOMAS</creator><creator>HARNISCH, WOLFGANG</creator><creator>SCHELER, ROLAND</creator><scope>EVB</scope></search><sort><creationdate>20010912</creationdate><title>MICROSCOPE, ESPECIALLY MICROSCOPE USED FOR INSPECTION IN SEMICONDUCTOR MANUFACTURE</title><author>ENGEL, THOMAS ; HARNISCH, WOLFGANG ; SCHELER, ROLAND</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP1131665A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2001</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>ENGEL, THOMAS</creatorcontrib><creatorcontrib>HARNISCH, WOLFGANG</creatorcontrib><creatorcontrib>SCHELER, ROLAND</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ENGEL, THOMAS</au><au>HARNISCH, WOLFGANG</au><au>SCHELER, ROLAND</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>MICROSCOPE, ESPECIALLY MICROSCOPE USED FOR INSPECTION IN SEMICONDUCTOR MANUFACTURE</title><date>2001-09-12</date><risdate>2001</risdate><abstract>A microscope, especially a microscope that is used for inspection in semiconductor manufacture is disclosed. The microscope comprises a pulsed laser for the purpose of illumination, preferably in the UV range. At least one rotating diffusion disk is disposed downstream of the laser so as to homogenize the illumination. Preferably, two rotating diffusion disks of opposite rotational sense are disposed in the illumination beam path either directly or indirectly one behind the other.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | eng ; fre ; ger |
recordid | cdi_epo_espacenet_EP1131665A1 |
source | esp@cenet |
subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
title | MICROSCOPE, ESPECIALLY MICROSCOPE USED FOR INSPECTION IN SEMICONDUCTOR MANUFACTURE |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-19T21%3A12%3A23IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=ENGEL,%20THOMAS&rft.date=2001-09-12&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EEP1131665A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |