Method for repair of photomasks

A method of repairing defects on masks includes the step of providing a coating on the mask to prevent damage to clear regions of the mask from laser ablation splatter, laser ablation caused quartz pitting, laser deposition staining, and FIB caused gallium staining. The coating is a metal, a polymer...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LEVIN, PETER J, WAGNER, ALFRED, ROCHEFORT, RAYMOND A, HAYDEN, DENNIS M, HIBBS, MICHAEL S, NEARY, TIMOTHY E, GRENON, BRIAN J, HAIGHT, RICHARD A, SCHMIDT, DENNIS A, SMOLINSKI, JACEK G
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!