Apparatus and method for determining the temperature of an object in thermal processing chambers

The present invention is generally directed to a system and process for accurately determining the temperature of an object, such as a semiconductive wafer, by sensing and measuring the object radiation being emitted at a particular wavelength. In particular, a reflective device is placed adjacent t...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	CHAMPETIER, ROBERT J
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	COLORIMETRY MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT MEASURING PHYSICS RADIATION PYROMETRY TESTING
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