Method and composition for etching of Al-Cu layers to form electronic circuits
An etchant useful for chemically milling aluminium from tri-metal layers of copper-aluminium-copper being copper circuit patterns present on opposing surfaces of an aluminium foil, one of the copper patterns being laminated onto a substrate, the etchant comprising an aqueous solution of: (1) 60 to 5...
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| creator | ACHARI, ACHYUTA PARUCHURI, MOHAN R |
| description | An etchant useful for chemically milling aluminium from tri-metal layers of copper-aluminium-copper being copper circuit patterns present on opposing surfaces of an aluminium foil, one of the copper patterns being laminated onto a substrate, the etchant comprising an aqueous solution of: (1) 60 to 500 g/l base selected from (a) sodium hydroxide, (b) potassium hydroxide, and (c) their mixture; and (2) 30 to 500 g/l of a nitrite salt, borate salt, a bromate salt, or a mixture of any of them. |
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and (2) 30 to 500 g/l of a nitrite salt, borate salt, a bromate salt, or a mixture of any of them.</description><edition>6</edition><language>eng ; fre ; ger</language><subject>CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS ; METALLURGY ; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 ; NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE ; PRINTED CIRCUITS</subject><creationdate>1999</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19990630&DB=EPODOC&CC=EP&NR=0926266A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19990630&DB=EPODOC&CC=EP&NR=0926266A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ACHARI, ACHYUTA</creatorcontrib><creatorcontrib>PARUCHURI, MOHAN R</creatorcontrib><title>Method and composition for etching of Al-Cu layers to form electronic circuits</title><description>An etchant useful for chemically milling aluminium from tri-metal layers of copper-aluminium-copper being copper circuit patterns present on opposing surfaces of an aluminium foil, one of the copper patterns being laminated onto a substrate, the etchant comprising an aqueous solution of: (1) 60 to 500 g/l base selected from (a) sodium hydroxide, (b) potassium hydroxide, and (c) their mixture; 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and (2) 30 to 500 g/l of a nitrite salt, borate salt, a bromate salt, or a mixture of any of them.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record> |
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| language | eng ; fre ; ger |
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| subjects | CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS METALLURGY MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE PRINTED CIRCUITS |
| title | Method and composition for etching of Al-Cu layers to form electronic circuits |
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