METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE WITH BiCMOS CIRCUIT

A method of manufacturing a semiconductor device with a bipolar transistor (1) and a MOS transistor (2) formed in a silicon body (3) which for this purpose is provided with a field insulation region (4) by which semiconductor regions (6, 7) adjoining a surface (5) of said body are mutually insulated...

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Bibliographische Detailangaben
Hauptverfasser: JANSEN, ALEXANDER, CECILIA, LEONARD, KOSTER, RONALD, VAN DER WEL, WILLEM, PRUIJMBOOM, ARMAND
Format: Patent
Sprache:eng ; fre ; ger
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