SPUTTERING TARGET WITH ULTRA-FINE, ORIENTED GRAINS AND METHOD OF MAKING SAME

There is disclosed a sputtering target comprising a body of metal such as aluminum and its alloy with an ultra-fine grain size and small second phase. Also described in a method for making an ultra-fine grain sputtering target comprising melting, atomizing, and depositing atomized metal to form a wo...

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Hauptverfasser: KARDOKUS, JANINE, KIYABU, EMIGH, ROGER, ALAN, DUNLOP, JOHN, ALDEN, YUAN, JUN
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Sprache:eng ; fre ; ger
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creator KARDOKUS, JANINE, KIYABU
EMIGH, ROGER, ALAN
DUNLOP, JOHN, ALDEN
YUAN, JUN
description There is disclosed a sputtering target comprising a body of metal such as aluminum and its alloy with an ultra-fine grain size and small second phase. Also described in a method for making an ultra-fine grain sputtering target comprising melting, atomizing, and depositing atomized metal to form a workpiece (60), and fabricating the workpiece (60) to form a sputtering target. A method is also disclosed that includes the steps of extruding a workpiece through a die having contiguous transverse inlet and outlet channels of substantially identical cross section, and fabricating the extruded article into a sputtering target. The extrusion may be performed several times, producing gain size of still smaller size and controlled grain texture.
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Also described in a method for making an ultra-fine grain sputtering target comprising melting, atomizing, and depositing atomized metal to form a workpiece (60), and fabricating the workpiece (60) to form a sputtering target. A method is also disclosed that includes the steps of extruding a workpiece through a die having contiguous transverse inlet and outlet channels of substantially identical cross section, and fabricating the extruded article into a sputtering target. The extrusion may be performed several times, producing gain size of still smaller size and controlled grain texture.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record>
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language eng ; fre ; ger
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subjects ALLOYS
AUXILIARY OPERATIONS USED IN CONNECTION WITH METAL-WORKINGWITHOUT ESSENTIALLY REMOVING MATERIAL
CASTING
CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS ANDNON-FERROUS ALLOYS
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
FERROUS OR NON-FERROUS ALLOYS
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
MAKING METALLIC POWDER
MANUFACTURE OF ARTICLES FROM METALLIC POWDER
MANUFACTURE OF METAL SHEETS, WIRE, RODS, TUBES OR PROFILES,OTHERWISE THAN BY ROLLING
MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVINGMATERIAL
METALLURGY
PERFORMING OPERATIONS
POWDER METALLURGY
PUNCHING METAL
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
TRANSPORTING
TREATMENT OF ALLOYS OR NON-FERROUS METALS
WORKING METALLIC POWDER
title SPUTTERING TARGET WITH ULTRA-FINE, ORIENTED GRAINS AND METHOD OF MAKING SAME
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