CHEMICALLY AMPLIFIED PHOTORESIST
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| creator | ITO, HIROSHI DIPIETRO, RICHARD, ANTHONY SACHDEV, HARBANS, SINGH BREYTA, GREGORY MOREAU, WAYNE, MARTIN MIURA, STEVE, SEIICHI KNORS, CHRISTOPHER, JOHN KWONG, RANEE, WAI-LING WELSH, KEVIN, MICHAEL BRUNSVOLD, WILLIAM, ROSS MONTGOMERY, MELVIN, WARREN |
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| language | eng ; fre ; ger |
| recordid | cdi_epo_espacenet_EP0698230A4 |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | CHEMICALLY AMPLIFIED PHOTORESIST |
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