An energy sensitive composition and a process for device fabrication using this composition
A novel resist composition is disclosed. The resist composition is used in a lithographic process for device fabrication. The resist composition contains a polymer with phosphorus ester moieties. These moieties make the resist composition suitable for use in a variety of lithographic processes for f...
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| creator | SCHILLING, MARCIA LEA HOULIHAN, FRANCIS MICHAEL KATZ, HOWARD EDAN |
| description | A novel resist composition is disclosed. The resist composition is used in a lithographic process for device fabrication. The resist composition contains a polymer with phosphorus ester moieties. These moieties make the resist composition suitable for use in a variety of lithographic processes for fabricating integrated circuits. |
| format | Patent |
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| language | eng ; fre ; ger |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | An energy sensitive composition and a process for device fabrication using this composition |
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