ENHANCED VERTICAL THERMAL REACTOR SYSTEM
An enhanced vertical thermal reactor system provides three isolated chambers including a wafer handling chamber, a process chamber including an elevator, and a cool down chamber, each sealed from the other. The sealing of these individual chambers, each from the other, has the effect of minimizing p...
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creator | OZARSKI, ROBERT, G MCNAUGHTON, ALLEN, D GLAZE, JAMES, A DEVILBISS, JOHN, J LUGOSI, STEVE |
description | An enhanced vertical thermal reactor system provides three isolated chambers including a wafer handling chamber, a process chamber including an elevator, and a cool down chamber, each sealed from the other. The sealing of these individual chambers, each from the other, has the effect of minimizing processing delays associated with the cooling process and the loading and unloading process to thereby improve the productivity of the furnace. The process chamber includes non-metallic media such that it can be operated in oxidation systems so that corrosive acids will not affect the process chamber operation. |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP0485461A4</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP0485461A4</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP0485461A43</originalsourceid><addsrcrecordid>eNrjZNBw9fNw9HN2dVEIcw0K8XR29FEI8XAN8gXSQa6OziH-QQrBkcEhrr48DKxpiTnFqbxQmptBwc01xNlDN7UgPz61uCAxOTUvtSTeNcDAxMLUxMzQ0cSYCCUAxxEjxw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>ENHANCED VERTICAL THERMAL REACTOR SYSTEM</title><source>esp@cenet</source><creator>OZARSKI, ROBERT, G ; MCNAUGHTON, ALLEN, D ; GLAZE, JAMES, A ; DEVILBISS, JOHN, J ; LUGOSI, STEVE</creator><creatorcontrib>OZARSKI, ROBERT, G ; MCNAUGHTON, ALLEN, D ; GLAZE, JAMES, A ; DEVILBISS, JOHN, J ; LUGOSI, STEVE</creatorcontrib><description>An enhanced vertical thermal reactor system provides three isolated chambers including a wafer handling chamber, a process chamber including an elevator, and a cool down chamber, each sealed from the other. The sealing of these individual chambers, each from the other, has the effect of minimizing processing delays associated with the cooling process and the loading and unloading process to thereby improve the productivity of the furnace. The process chamber includes non-metallic media such that it can be operated in oxidation systems so that corrosive acids will not affect the process chamber operation.</description><edition>5</edition><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; BLASTING ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; FURNACES ; FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL ; HEATING ; KILNS ; LIGHTING ; MECHANICAL ENGINEERING ; OPEN SINTERING OR LIKE APPARATUS ; OVENS ; RETORTS ; SEMICONDUCTOR DEVICES ; WEAPONS</subject><creationdate>1993</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19930915&DB=EPODOC&CC=EP&NR=0485461A4$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19930915&DB=EPODOC&CC=EP&NR=0485461A4$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>OZARSKI, ROBERT, G</creatorcontrib><creatorcontrib>MCNAUGHTON, ALLEN, D</creatorcontrib><creatorcontrib>GLAZE, JAMES, A</creatorcontrib><creatorcontrib>DEVILBISS, JOHN, J</creatorcontrib><creatorcontrib>LUGOSI, STEVE</creatorcontrib><title>ENHANCED VERTICAL THERMAL REACTOR SYSTEM</title><description>An enhanced vertical thermal reactor system provides three isolated chambers including a wafer handling chamber, a process chamber including an elevator, and a cool down chamber, each sealed from the other. The sealing of these individual chambers, each from the other, has the effect of minimizing processing delays associated with the cooling process and the loading and unloading process to thereby improve the productivity of the furnace. The process chamber includes non-metallic media such that it can be operated in oxidation systems so that corrosive acids will not affect the process chamber operation.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>BLASTING</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>FURNACES</subject><subject>FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL</subject><subject>HEATING</subject><subject>KILNS</subject><subject>LIGHTING</subject><subject>MECHANICAL ENGINEERING</subject><subject>OPEN SINTERING OR LIKE APPARATUS</subject><subject>OVENS</subject><subject>RETORTS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>WEAPONS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1993</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNBw9fNw9HN2dVEIcw0K8XR29FEI8XAN8gXSQa6OziH-QQrBkcEhrr48DKxpiTnFqbxQmptBwc01xNlDN7UgPz61uCAxOTUvtSTeNcDAxMLUxMzQ0cSYCCUAxxEjxw</recordid><startdate>19930915</startdate><enddate>19930915</enddate><creator>OZARSKI, ROBERT, G</creator><creator>MCNAUGHTON, ALLEN, D</creator><creator>GLAZE, JAMES, A</creator><creator>DEVILBISS, JOHN, J</creator><creator>LUGOSI, STEVE</creator><scope>EVB</scope></search><sort><creationdate>19930915</creationdate><title>ENHANCED VERTICAL THERMAL REACTOR SYSTEM</title><author>OZARSKI, ROBERT, G ; MCNAUGHTON, ALLEN, D ; GLAZE, JAMES, A ; DEVILBISS, JOHN, J ; LUGOSI, STEVE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP0485461A43</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1993</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>BLASTING</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>FURNACES</topic><topic>FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL</topic><topic>HEATING</topic><topic>KILNS</topic><topic>LIGHTING</topic><topic>MECHANICAL ENGINEERING</topic><topic>OPEN SINTERING OR LIKE APPARATUS</topic><topic>OVENS</topic><topic>RETORTS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>WEAPONS</topic><toplevel>online_resources</toplevel><creatorcontrib>OZARSKI, ROBERT, G</creatorcontrib><creatorcontrib>MCNAUGHTON, ALLEN, D</creatorcontrib><creatorcontrib>GLAZE, JAMES, A</creatorcontrib><creatorcontrib>DEVILBISS, JOHN, J</creatorcontrib><creatorcontrib>LUGOSI, STEVE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>OZARSKI, ROBERT, G</au><au>MCNAUGHTON, ALLEN, D</au><au>GLAZE, JAMES, A</au><au>DEVILBISS, JOHN, J</au><au>LUGOSI, STEVE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ENHANCED VERTICAL THERMAL REACTOR SYSTEM</title><date>1993-09-15</date><risdate>1993</risdate><abstract>An enhanced vertical thermal reactor system provides three isolated chambers including a wafer handling chamber, a process chamber including an elevator, and a cool down chamber, each sealed from the other. The sealing of these individual chambers, each from the other, has the effect of minimizing processing delays associated with the cooling process and the loading and unloading process to thereby improve the productivity of the furnace. The process chamber includes non-metallic media such that it can be operated in oxidation systems so that corrosive acids will not affect the process chamber operation.</abstract><edition>5</edition><oa>free_for_read</oa></addata></record> |
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subjects | BASIC ELECTRIC ELEMENTS BLASTING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FURNACES FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL HEATING KILNS LIGHTING MECHANICAL ENGINEERING OPEN SINTERING OR LIKE APPARATUS OVENS RETORTS SEMICONDUCTOR DEVICES WEAPONS |
title | ENHANCED VERTICAL THERMAL REACTOR SYSTEM |
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