ANTISTATIC COMPOSITION AND ANTISTATIC CHLORINATED RESIN COMPOSITION COMPRISING SAID ANTISTATIC COMPOSITION AND PROCESS FOR PREPARING THE SAME

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: ANDO, SUMIO, KAGOYAMA, ATSUMU, MIYAMOTO, YASUMITSU
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator ANDO, SUMIO
KAGOYAMA, ATSUMU
MIYAMOTO, YASUMITSU
description
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP0423329A4</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP0423329A4</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP0423329A43</originalsourceid><addsrcrecordid>eNqNjMEKwjAQRHPxIOo_7A8I0vTicUm3ZsEmIdl7KRJPooX6G_6zKXiwnjzNMDNv1uqFTjgJChswvgs-sbB3gK6B78qefWSHQg1ESuwW49lHLukJEvIS_PkM0RtKCVofi6eAcabEUiE72qrVdbhNeffRjYKWxNh9Hh99nsbhku_52VM41JXW1RFr_cfkDZwqQA0</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>ANTISTATIC COMPOSITION AND ANTISTATIC CHLORINATED RESIN COMPOSITION COMPRISING SAID ANTISTATIC COMPOSITION AND PROCESS FOR PREPARING THE SAME</title><source>esp@cenet</source><creator>ANDO, SUMIO ; KAGOYAMA, ATSUMU ; MIYAMOTO, YASUMITSU</creator><creatorcontrib>ANDO, SUMIO ; KAGOYAMA, ATSUMU ; MIYAMOTO, YASUMITSU</creatorcontrib><edition>5</edition><language>eng</language><subject>ADHESIVES ; CHEMISTRY ; DYES ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; PAINTS ; POLISHES</subject><creationdate>1991</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19910605&amp;DB=EPODOC&amp;CC=EP&amp;NR=0423329A4$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19910605&amp;DB=EPODOC&amp;CC=EP&amp;NR=0423329A4$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ANDO, SUMIO</creatorcontrib><creatorcontrib>KAGOYAMA, ATSUMU</creatorcontrib><creatorcontrib>MIYAMOTO, YASUMITSU</creatorcontrib><title>ANTISTATIC COMPOSITION AND ANTISTATIC CHLORINATED RESIN COMPOSITION COMPRISING SAID ANTISTATIC COMPOSITION AND PROCESS FOR PREPARING THE SAME</title><subject>ADHESIVES</subject><subject>CHEMISTRY</subject><subject>DYES</subject><subject>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>PAINTS</subject><subject>POLISHES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1991</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjMEKwjAQRHPxIOo_7A8I0vTicUm3ZsEmIdl7KRJPooX6G_6zKXiwnjzNMDNv1uqFTjgJChswvgs-sbB3gK6B78qefWSHQg1ESuwW49lHLukJEvIS_PkM0RtKCVofi6eAcabEUiE72qrVdbhNeffRjYKWxNh9Hh99nsbhku_52VM41JXW1RFr_cfkDZwqQA0</recordid><startdate>19910605</startdate><enddate>19910605</enddate><creator>ANDO, SUMIO</creator><creator>KAGOYAMA, ATSUMU</creator><creator>MIYAMOTO, YASUMITSU</creator><scope>EVB</scope></search><sort><creationdate>19910605</creationdate><title>ANTISTATIC COMPOSITION AND ANTISTATIC CHLORINATED RESIN COMPOSITION COMPRISING SAID ANTISTATIC COMPOSITION AND PROCESS FOR PREPARING THE SAME</title><author>ANDO, SUMIO ; KAGOYAMA, ATSUMU ; MIYAMOTO, YASUMITSU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP0423329A43</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1991</creationdate><topic>ADHESIVES</topic><topic>CHEMISTRY</topic><topic>DYES</topic><topic>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>PAINTS</topic><topic>POLISHES</topic><toplevel>online_resources</toplevel><creatorcontrib>ANDO, SUMIO</creatorcontrib><creatorcontrib>KAGOYAMA, ATSUMU</creatorcontrib><creatorcontrib>MIYAMOTO, YASUMITSU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ANDO, SUMIO</au><au>KAGOYAMA, ATSUMU</au><au>MIYAMOTO, YASUMITSU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ANTISTATIC COMPOSITION AND ANTISTATIC CHLORINATED RESIN COMPOSITION COMPRISING SAID ANTISTATIC COMPOSITION AND PROCESS FOR PREPARING THE SAME</title><date>1991-06-05</date><risdate>1991</risdate><edition>5</edition><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_EP0423329A4
source esp@cenet
subjects ADHESIVES
CHEMISTRY
DYES
MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
PAINTS
POLISHES
title ANTISTATIC COMPOSITION AND ANTISTATIC CHLORINATED RESIN COMPOSITION COMPRISING SAID ANTISTATIC COMPOSITION AND PROCESS FOR PREPARING THE SAME
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-11T19%3A43%3A43IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=ANDO,%20SUMIO&rft.date=1991-06-05&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EEP0423329A4%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true