Method of manufacturing a thin film of an oxidic superconducting material in accordance with a pattern

A method of manufacturing a thin film of an oxidic superconducting material in accordance with a pattern, in which a pattern is manufactured by means of etching using reactive ions and a mask of aluminium oxide or silicon oxide, said method enabling patterns having line widths smaller than 2 mu m to...

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Bibliographische Detailangaben
1. Verfasser: HEIJMAN, MARITZA GERARDA JOSEPHA
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
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