PLASMA AMPLIFIED PHOTOELECTRON PROCESS ENDPOINT DETECTION APPARATUS

A plasma processing apparatus and process endpoint detection method comprising a plasma chamber for processing an item that has a first portion of a first material and a second portion of a second material, with the first and second materials having different work functions, and means for generating...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KELLER, JOHN HOWARD, SELWYN, GARY STEWART, SINGH, JOYTHI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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